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Motor assembly, lithography apparatus and device manufacturing method

A technology for motor components and electromagnetic components, which can be used in microlithography exposure equipment, semiconductor/solid-state device manufacturing, electric components, etc., and can solve problems such as low force density

Active Publication Date: 2022-02-25
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Currently available electromagnetic motors still have lower than expected force densities

Method used

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  • Motor assembly, lithography apparatus and device manufacturing method
  • Motor assembly, lithography apparatus and device manufacturing method
  • Motor assembly, lithography apparatus and device manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] figure 1 A lithographic apparatus according to an embodiment of the invention is schematically shown. The lithographic apparatus comprises an illumination system IL, a support structure MT, a substrate table WT and a projection system PS. The illumination system IL is configured to condition the radiation beam B. The support structure MT is configured to support the patterning device MA and is connected to a first positioning device PM configured to precisely position the patterning device MA according to certain parameters. The substrate table WT is configured to hold a substrate W (e.g., a photoresist-coated wafer) and is connected to a second positioner PW configured to precisely position the substrate according to certain parameters W. The projection system PS is configured to project the pattern imparted to the radiation beam B by the patterning device MA onto a target portion C of the substrate W (eg, comprising one or more dies).

[0038] The illumination sy...

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PUM

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Abstract

A motor assembly for driving an object in a drive direction is described, the motor assembly includes: a plurality of linear motors, each configured to generate a drive force in a drive direction, each linear motor includes a first electromagnetic assembly and is configured is a second electromagnetic assembly cooperating with the first electromagnetic assembly for generating a driving force; wherein the first electromagnetic assembly and the second magnetic assembly face each other and define a gap between each other in a direction perpendicular to the driving direction; the first an interface for connecting the first electromagnetic assembly to the common member; a second interface for connecting the second electromagnetic assembly to the object to be driven; wherein the first electromagnetic assembly and the second electromagnetic assembly are in a direction perpendicular to the driving direction stacked on top, and wherein at least one of the first interface and the second interface is configured to enable a relative displacement between the corresponding first electromagnetic assembly and the second electromagnetic assembly in a direction perpendicular to the driving direction.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from European Application 16195045.6 filed 21 October 2016, which is hereby incorporated by reference in its entirety. technical field [0003] The invention relates to an electrical machine assembly, a lithographic apparatus and a method for fabricating a device. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern on a substrate, usually a target portion of the substrate. For example, lithographic equipment can be used to fabricate integrated circuits (ICs). In this case, a patterning device (alternatively referred to as a mask or reticle) may be used to generate the circuit pattern to be formed on the various layers of the IC. The pattern can be transferred to a target portion (eg, including a portion of a die, a die, or a plurality of dies) on a substrate (eg, a silicon wafer). The transfer of the pattern usually takes place via imag...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H02K41/03H02K16/00
CPCG03F7/70758H02K41/031H02K16/00G03F7/70258G03F7/70716G03F7/70991H01L21/68H02K2201/18G03F7/2002G03F7/70141
Inventor P·J·H·杜杰森A·F·J·德格罗特
Owner ASML NETHERLANDS BV