Efficient high-quality chemical mechanical polishing liquid of yttrium aluminum garnet crystal

Abstract

The invention discloses an efficient high-quality chemical mechanical polishing liquid of a yttrium aluminum garnet crystal and belongs to the field of ultraprecision machining of hard and brittle materials. At the room temperature, grinding materials zirconium oxide, sodium silicate and magnesium oxide are respectively put into ionized water and are oscillated for 10 minutes in ultrasonic equipment to prepare the chemical mechanical polishing liquid. In the chemical mechanical polishing liquid, the concentration of zirconium oxide is 0.02-0.12g / ml, the particle size of the zirconium oxide is0.02-0.20mu m, the concentration of the sodium silicate is 0.03-0.15g / ml, and the concentration of the magnesium oxide is 1-5g / L. When the yttrium aluminum garnet crystal is polished with the polishing liquid disclosed by the invention, the yttrium aluminum garnet crystal has high surface quality and polishing material removal rates.

Description

technical field [0001] The invention belongs to the field of ultra-precision processing of hard and brittle materials, and relates to the preparation of a chemical mechanical polishing liquid for crystal materials, in particular to the preparation of a chemical mechanical polishing liquid for yttrium aluminum garnet crystals. Background technique [0002] With the development of society, laser has been widely used in manufacturing, medical treatment, national defense and other fields. Yttrium aluminum garnet crystal has become the most widely used laser crystal because of its good physical and chemical properties. In order to obtain a better laser beam and a larger laser threshold, the surface and subsurface quality of the laser wafer play a crucial role. Defects and damages on the surface of the wafer will cause the laser to scatter during propagation, resulting in local energy accumulation, which greatly reduces the performance of the laser. [0003] At present, the proc...

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Problems solved by technology

Patent CN 103059738 A uses a mixture of nitric acid, water and emulsified corundum to polish YAG crystals. However, due to the high hardness of alumina, dislocations, fine scratches and large subsurface damage are prone to occur after crystal processing, and nitric acid severely corrodes equipment , greater environmental pollution, high cost of waste liquid treatment

Patent CN 108838745 A uses a mixed aqueous solution of zirconia and sodium hydroxide to chemically mechanically polish YAG crystals, but the material removal rate is low, only 1.99nm / min, and the surface quality needs to be improved

Therefore, the existing problems of traditional polishing fluid include: (1) poor surface quality; (2) low removal efficiency; (3) high cost

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