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Rotation Mechanism for Absolute Surface Shape Detection of Interferometer Plane Standard Mirror

A technology of a rotating mechanism and a standard mirror, which is applied to instruments, measuring devices, and optical devices, etc., can solve the problems of inability to discriminate the accuracy of measurement results, limitation of the accuracy of three-sided mutual inspection, and inability to estimate deformation variables, so as to reduce deformation, The effect of improving accuracy and reducing measurement errors

Active Publication Date: 2020-11-10
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

[0003] At this stage, interferometer detection is all relative measurement, and the accuracy of interferometric detection is limited by the reference mirror shape of the interferometer itself (PV value is generally better than 0.1λ), especially when the surface quality PV of the detection element is better than 0.1λ or even higher At this time, the accuracy of the measurement results cannot be judged, and it is necessary to separate the reference mirror error to achieve absolute measurement
[0004] In the current three-sided mutual inspection method, the rotation accuracy is not high enough, and the standard mirror clamping is prone to deformation, and the deformation cannot be estimated, which limits the accuracy of the three-sided mutual inspection.

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  • Rotation Mechanism for Absolute Surface Shape Detection of Interferometer Plane Standard Mirror
  • Rotation Mechanism for Absolute Surface Shape Detection of Interferometer Plane Standard Mirror
  • Rotation Mechanism for Absolute Surface Shape Detection of Interferometer Plane Standard Mirror

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Embodiment Construction

[0029] The present invention will be further described below in conjunction with embodiment, but should not limit the transformation scope of the present invention with this.

[0030] see first figure 1 , figure 2 , image 3 , Figure 4 , Figure 5 , figure 1 is the front view of the present invention; figure 2 is the rear view of the present invention; image 3 It is a top view of the present invention; Figure 4 The front view of the glued standard mirror for the plane standard mirror fixing ring; Figure 5 It is the top view of the plane standard mirror fixing ring glued standard mirror; As can be seen from the figure, the composition of the best embodiment of a kind of rotating mechanism for the absolute surface shape detection of the interferometer plane standard mirror of the present invention comprises the described plane standard mirror to be measured , a plane standard mirror fixing ring for the plane standard mirror to be measured, a mirror frame, a circula...

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Abstract

The invention relates to a rotating mechanism for detecting absolute facial form of a plane standard lens of an interferometer; the rotating mechanism mainly comprises a to-be-detected plane standardlens, a plane standard lens fixing ring for placing the to-be-detected plane standard lens, a lens frame, a round angle measurement grating ruler, a round angle measurement grating ruler chain connecting plate, a round angle measurement grating ruler fixing plate, an electric rotating mechanism and a control system thereof. According to the rotating mechanism in the invention, rapid replacement and rotation angle precision control of plane standard lens facial form absolute detection are realized, the purpose of improving the detection precision is achieved, the processing level can be evaluated more symbolically, guidance significance is provided for further improvement of the processing precision, and meanwhile, important reference significance can be provided for metering and calibration of various caliber interferometers.

Description

technical field [0001] The invention relates to high-precision detection of high-precision planar optical elements, in particular to a rotating mechanism for detecting the absolute surface shape of a planar standard mirror of an interferometer. It can realize the absolute surface shape detection of the full aperture of planar components, improve the detection accuracy, and have a more iconic quantitative processing level, which realizes guiding significance for further breakthroughs in processing accuracy, and at the same time can provide important references for the measurement and calibration of various caliber interferometers. D. Background technique [0002] At present, optical components have higher and higher requirements for detection level, especially in projection lithography exposure optical system, the RMS value of component surface shape is required to reach nanometer or even sub-nanometer level, which is a very high challenge for optical detection level. At pre...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B9/02
CPCG01B9/02072
Inventor 白云波周游刘世杰邵建达鲁棋徐天柱王圣浩潘靖宇
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI