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Pixel photomask, method for producing display, and display

A display and photomask technology, applied in the direction of originals, optics, instruments, etc. for photomechanical processing, can solve problems such as reducing light penetration

Inactive Publication Date: 2019-07-30
TUNGHSU KUNSHAN DISPLAY MATERIAL CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the current TFT-LCD pixel design, in general corners, due to the relationship between the light-shielding layer BM (photoresist), it is not sharp, but arc-shaped, and this part will reduce the penetration of light

Method used

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  • Pixel photomask, method for producing display, and display
  • Pixel photomask, method for producing display, and display
  • Pixel photomask, method for producing display, and display

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Embodiment Construction

[0018] The specific implementation manners of the embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific implementation manners described here are only used to illustrate and explain the embodiments of the present invention, and are not intended to limit the embodiments of the present invention.

[0019] figure 1 is an example of a pixel mask design drawing and an actual product drawing, where, figure 1 a is the pixel mask design drawing, figure 1 b is the actual product picture of CF (Color Filter, color filter). The light passes through the pixel mask and then irradiates the light-shielding layer in CF. After exposure and development process, the actual product picture of CF is formed. Such as figure 1 As shown in a, the part of the pixel mask is mainly divided into a light-transmitting area and a non-light-transmitting area, wherein the black part is the light-transmi...

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PUM

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Abstract

The embodiment of the invention provides a pixel photomask, a method for producing a display, and the display, and belongs to the technical field of display. The pixel photomask comprises: a main light transmitting area for transmitting light; and an auxiliary light transmitting area arranged at the corner of the main light transmitting area for slowing down the diffraction of the light at the corner. Thereby, the light transmittance is improved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a pixel mask, a method for producing a display and the display. Background technique [0002] The improvement of the transmittance has always been an important issue in the display industry, and the value of the increased transmittance has even reached the point where it must be compared. Since TFT-LCD is a passive display element, it needs to be equipped with a light source in order to make the function work normally. And improving the transmittance of TFT-LCD can effectively reduce energy consumption. In the current TFT-LCD pixel design, in general corners, due to the relationship between the light-shielding layer BM (photoresist), it is not sharp but arc-shaped, and this part will reduce light penetration. Contents of the invention [0003] The object of the present invention is to provide a pixel mask, a method for producing a display, and a display, which can realize th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1335G03F1/00
CPCG02F1/133516G03F1/00
Inventor 李青李赫然蔡财福
Owner TUNGHSU KUNSHAN DISPLAY MATERIAL CO LTD