The invention relates to an evaporation deposition film mask plate, a manufacturing method thereof, an electromagnetic evaporation deposition device and an evaporation deposition method. The problem that in an existing electromagnetic evaporation deposition device, due to the effect of gravity, the middle position of an evaporation deposition film mask plate sags more, an evaporation deposition material is liable to diffract at a gap is solved. The evaporation deposition film mask plate comprises a film mask plate main body and a plurality of openings formed in the film mask plate main body. Each opening serves as an evaporation deposition area, and the other parts of the film mask plate main body except the openings serve as a shielding area. A first groove is formed in the shielding area and filled with a magnetic material, and the magnetism of the magnetic material is stronger than that of a film mask plate main body material. The first groove is formed in the evaporation deposition film mask plate main body and filled with the magnetic material with the stronger magnetism, so that the attracting force of an electromagnetic device in the electromagnetic evaporation deposition device to the evaporation deposition film mask plate can be increased, a gap between the evaporation deposition film mask plate and a base plate to be subjected to evaporation deposition can be reduced, and diffracting of the evaporation deposition material at the gap is avoided.