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Synthetic aperture camera calibration method based on light field distribution

A technology of light field distribution and synthetic aperture, applied in the field of optical engineering, can solve the problems of pupil aberration, the influence of three-dimensional measurement accuracy, and the inability of a single pinhole model to perfectly express the relationship between camera objects and images, so as to eliminate pupil aberration. , Overcome direction ambiguity and improve the effect of measurement accuracy

Active Publication Date: 2019-08-20
FUDAN UNIV
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Problems solved by technology

However, since the pupil of the camera lens has a certain size, this assumption will produce pupil aberration, and the calculated light position and direction will contain obvious deviations, so the single pinhole model cannot perfectly express the object-image relationship of the camera. 3D measurement accuracy is seriously affected

Method used

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  • Synthetic aperture camera calibration method based on light field distribution
  • Synthetic aperture camera calibration method based on light field distribution
  • Synthetic aperture camera calibration method based on light field distribution

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Embodiment 1

[0025] Embodiment 1: During the measurement process, a suitable imaging optical path is set up, and the DMD is used to perform 5×5 pupil sampling. The CCD pixel resolution used in the experiment is 3840×3840, so the dimension of the light field matrix L is 25×14745600 ((5×5)×(3840×3840)). Since the actual imaging process is not strictly small-hole imaging, the light of a single object point will only pass through part of the pupil and be imaged on a certain CCD pixel, which is the light field distribution. In other words, each sub-pupil determines part of the light to be imaged on the CCD on, such as figure 1 shown. According to the light field distribution, the CCD image plane is divided according to the energy distribution of the sub-pupils on the image plane, and each sub-pupil is regarded as a pinhole imaging model. The new camera imaging model is as follows: figure 2 shown. The object point P1 passes through the 0th sub-pupil and is imaged at p1 of the CCD, and the pu...

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Abstract

The invention belongs to the technical field of precision measurement and particularly relates to a synthetic aperture camera calibration method based on light field distribution. The method comprisessteps: in order to overcome the pupil aberration problem of a pinhole camera model, an imaging pupil is divided into a plurality of sub pupils, and according to actual light field distribution, an imaging sensor is divided into different imaging areas corresponding to sub pupils; and in combination of synthetic aperture camera model joint calibration optimization, a camera model more in line withthe actual imaging process is constructed. The pupil aberration caused by single pinhole imaging hypothesis can be effectively eliminated, the direction ambiguity of monocular vision is overcome, andgreat significance is achieved for improving the measurement precision of a photogrammetry technology.

Description

technical field [0001] The invention belongs to the technical field of optical engineering, and in particular relates to a method for calibrating a synthetic aperture camera based on light field distribution. Background technique [0002] In modern precision measurement, photogrammetry is a commonly used 3D shape measurement technique. Photogrammetry is mainly divided into two categories: surface 3D measurement techniques for diffuse reflection and surface 3D measurement techniques for specular reflection. The former is typically represented by triangulation, especially fringe projection technology is widely used in industrial precision inspection. Its 3D reconstruction methods mainly include stereo vision and phase-height mapping. For specularly reflective surfaces, phase measurement deflection is commonly used. Because of its simple measurement system, large dynamic range, and strong anti-interference ability, it can be used for the measurement of complex surfaces, and ...

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Application Information

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IPC IPC(8): G01B11/24G01C25/00G06T7/80
CPCG01B11/24G01B21/042G01C25/00G06T7/80
Inventor 张祥朝牛振岐朱熠帆徐敏
Owner FUDAN UNIV
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