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Device and method for cleaning monocrystal pulling apparatus

一种提拉装置、清洁装置的技术，应用在利用工具的清洁方法、利用气体流动的清洁方法、清洁方法和用具等方向，能够解决单晶位错化、晶体提拉特性恶化等问题，达到容易变形或移动的效果

Active Publication Date: 2019-09-17
SUMCO CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The dust may affect the pulling growth and cause dislocation of the single crystal, and deteriorate the pulling characteristics of the crystal

Method used

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  • Device and method for cleaning monocrystal pulling apparatus
  • Device and method for cleaning monocrystal pulling apparatus
  • Device and method for cleaning monocrystal pulling apparatus

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0060] Hereinafter, a first embodiment of a cleaning device for a single crystal pulling device according to the present invention will be described with reference to the drawings.

[0061] figure 1 It is a front sectional view showing a single crystal pulling device cleaned by the cleaning device in this embodiment, and in the figure, reference numeral "1" is a single crystal pulling device.

[0062] The single crystal pulling device 1 involved in this embodiment is a device for pulling and growing a single crystal by the Czochralski (CZ) method, such as figure 1 As shown, there are a chamber 2 as a closed container, a crystal pulling chamber 1a on the upper part of the chamber 2, a carbon susceptor (susceptor) 3s installed inside the chamber 2, a quartz crucible 3 arranged on the susceptor 3s, The cylindrical carbon heater 4 arranged around the quartz crucible 3, the cylindrical heat insulating tube 5 arranged around the carbon heater 4, and the carbon heat insulating tube ...

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PUM

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Abstract

A cleaning device 10 for cleaning the inside of a monocrystal pulling apparatus 1 comprises a main tube part 11 which can be inserted into a pull chamber 1a, and an inner surface cleaning mechanism 17 which is provided at the upper portion of the main tube part and is for cleaning the inner surface of the pull chamber, wherein the main tube part has a retreat / housing part 12 for housing therein a retreating seed chuck provided at the lower portion of a wire, and a continuous extension mechanism 13 which is provided at the lower portion of the main tube part and which enables a plurality of extension rods 13A-13D to be added and to extend in the axial direction, whereby the inside of the pull chamber is efficiently cleaned.

Description

technical field [0001] The present invention relates to a cleaning device and a cleaning method for a single crystal pulling device, and in particular to a technology suitable for cleaning in a single crystal pulling device. The single crystal pulling device utilizes wires and uses the Czochralski method (Czochralski method, Czochralski single crystal pulling method) to pull semiconductor single crystals such as single crystal silicon from the semiconductor melt in the crucible. Background technique [0002] Generally, a single crystal pulling apparatus using the CZ method is known as one of mechanisms for growing a semiconductor single crystal such as silicon (Si) or gallium arsenide (GaAs). In order to perform pulling growth in this single crystal pulling device, first, the semiconductor melt is stored in a quartz crucible arranged inside a chamber as a closed container, and the semiconductor melt is stored by a heater arranged around the quartz crucible. Melt heating is ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B29/06
CPCC30B29/06C30B15/00B08B9/0321C30B15/20C30B35/00B08B9/0436B08B1/143B08B1/30B08B5/00B08B9/087
Inventor 冲田宪治
Owner SUMCO CORP