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A kind of array substrate and manufacturing method thereof

A technology of an array substrate and a manufacturing method, which is applied in the display field, can solve the problems of decreased process yield, increased time, material cost, etc., and achieves the effects of saving process time, reducing the number of uses, and reducing costs

Active Publication Date: 2021-09-24
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As we all know, each additional process step will not only increase time and material costs, but also bring the risk of process yield decline

Method used

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  • A kind of array substrate and manufacturing method thereof
  • A kind of array substrate and manufacturing method thereof
  • A kind of array substrate and manufacturing method thereof

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Embodiment Construction

[0048] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the drawings in the embodiments of the present invention. Apparently, the described embodiments are only some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts fall within the protection scope of the present invention.

[0049] The terms "first", "second", "third", etc. (if any) in the description and claims of the present invention and the above drawings are used to distinguish similar objects and not necessarily to describe a specific order or sequentially. It should be understood that the items so described are interchangeable under appropriate circumstances. Furthermore, the terms "comprising" and "having", as well as any variations thereof, are intended to cover a non-exclusive in...

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Abstract

The invention discloses an array substrate and a manufacturing method thereof. The array substrate is provided with a thin film transistor area, a wiring area, and a light emitting area, and the thin film transistor area includes a stacked glass substrate, a light shielding layer, a buffer layer, an active layer, a gate insulating layer, a metal layer, and a pixel definition layer, electroluminescent layer and cathode layer. The manufacturing method of the array substrate includes the steps of: providing a glass substrate, making a light-shielding layer and a wiring layer, making a pixel layer, making a buffer layer, making an active layer and an anode layer, making a grid insulating layer, performing plasma doping treatment, making metal layer, make pixel definition layer, make electroluminescent layer and make cathode layer. In the present invention, multiple film layers share one mask to complete the patterning process when making the array substrate, thereby reducing the number of masks used, simplifying the manufacturing process, improving production efficiency, and saving process time and cost; and The structure of the array substrate is simple and reasonable, and a light and thin design is realized.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an array substrate of a top-gate thin film transistor and a manufacturing method thereof. Background technique [0002] At present, in the active matrix organic light-emitting diode (AMOLED) display device, the top-gate thin-film transistor (Top-gate TFT) array substrate has a complex structure, and the number of film layers increases the process steps. A minimum of 11 mask plates are required for the fabrication of . As we all know, each additional process step will not only increase time and material costs, but also bring the risk of process yield decline. [0003] Therefore, it is really necessary to develop a new type of array substrate and its manufacturing method to overcome the defects in the prior art. Contents of the invention [0004] The present invention provides an array substrate and a manufacturing method thereof. By changing the structure of the array substra...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/32H01L51/56
CPCH01L27/1288H10K59/12H10K59/1213H10K59/1201H10K71/00
Inventor 唐甲任章淳
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD