Etching cleaning machine

A cleaning machine and etching technology, applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., can solve the problems of poor cleaning effect, rust, poor safety, etc., and achieve good cleaning effect.

Pending Publication Date: 2019-11-15
徐松
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] After the etching is completed, impurities such as ink, water stains, and chemical reagents will remain on the surface. If they are not cleaned off in time and thoroughly, it will cause discoloration and rust of the etched product, which will seriously affect the quality of the etched product. Traditional, After the etching of the etched product is completed, the etched product is usually directly put into the cleaning pool for cleaning, and the etched product is manually taken out after the cleaning is completed, which not only causes a waste of labor, but also has poor safety and poor cleaning effect. OK, so an etch cleaner is very important

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Etching cleaning machine
  • Etching cleaning machine
  • Etching cleaning machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention.

[0025] In describing the present invention, it should be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", " The orientation or positional relationship indicated by "outside", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, so as to Specific orientation configurations and operations, therefore, are not to be construed as limitations on the invention.

[0026] refer to Figure ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an etching cleaning machine, and belongs to the technical field of the etching cleaning machine. The etching cleaning machine comprises a fixing frame, wherein the inner wall of the fixing frame is respectively and fixedly connected with a first pool and a second pool, the output end of a first motor is connected with a driving gear through a rotating shaft, the outer wallof the rotating shaft is further rotationally connected with a connecting block, the outer wall of the connecting block is connected with a connecting plate, a concave hole is formed in the connectingplate, and a driven gear meshing with the driving gear is rotationally connected in the concave hole; one end, away from the connecting block, of the connecting plate is connected with a baffle through a flange plate, the inner wall of the baffle is connected with a limiting rod, the limiting rod is connected with an etching product main body, and the output end of a second motor is fixedly connected with the connecting block. The etching cleaning machine can improve the cleaning effect of the etching product, reduce the labor waste and labor intensity, and improve the safety and working efficiency.

Description

technical field [0001] The invention relates to the technical field of etching cleaning machines, in particular to an etching cleaning machine. Background technique [0002] After the etching is completed, impurities such as ink, water stains, and chemical reagents will remain on the surface. If they are not cleaned off in time and thoroughly, it will cause discoloration and rust of the etched product, which will seriously affect the quality of the etched product. Traditional, After the etching of the etched product is completed, the etched product is usually directly put into the cleaning pool for cleaning, and the etched product is manually taken out after the cleaning is completed, which not only causes a waste of labor, but also has poor safety and poor cleaning effect. OK, so an etch cleaner is very important. Contents of the invention [0003] The purpose of the present invention is to solve the problems in the prior art, and propose an etching cleaning machine. ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/08B08B3/10B08B3/02B08B13/00
CPCB08B3/022B08B3/08B08B3/10B08B13/00
Inventor 徐松
Owner 徐松
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap