Novel silicon-containing monomer and organosilicone modified waterborne UV-curable polyurethane emulsion containing silicon-containing monomer

A silicon monomer, a new type of technology, applied in the field of polyurethane, can solve the problems of low grafting rate and low organic silicon content
CN110452260AInactive Publication Date: 2019-11-15FUQING HONGBAO CHEM CO LTD

Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
FUQING HONGBAO CHEM CO LTD
Publication Date
2019-11-15
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a novel silicon-containing monomer and an organosilicone modified waterborne UV-curable polyurethane emulsion containing the silicon-containing monomer. The novel silicon-containing monomer comprises the following components in parts by weight: 100 parts of acrylic acid, 0.3 part of N,N-dimethylbenzylamine, 100 parts of gamma-glycidyl ether oxypropyl trimethoxysilane, and 0.5 part of p-hydroxyanisole. The novel silicon-containing monomer simultaneously containing various functional groups of hydroxyl, siloxane and carbon-carbon double bond (C=C) in the molecular structure is prepared by a reaction of gamma-glycidyl ether oxypropyl trimethoxysilane (tau-glycidyl ether oxypropyl trimethoxysilane) with acrylic acid (AA), then the novel silicon-containing monomer is used as a novel blocking agent to modify polyurethane to prepare the photo-curable polyurethane emulsion.
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Description

technical field

[0001] The invention relates to the field of polyurethane, and more specifically relates to a novel silicon-containing monomer and a silicone-modified water-based UV-curable polyurethane emulsion containing the silicon monomer. Background technique

[0002] Waterborne polyurethane is widely used in various fields because of its environmental friendliness, safety and reliability, and easy modification. However, water-based polyurethane still has problems such as poor high temperature resistance and water resistance, and low hardness, which limits its wider application. Organosiloxane has a unique chemical structure, and its surface energy is low, so it is enriched to the surface during the film forming process, which can endow the modified polymer film with excellent water resistance, oil resistance, weather resistance, high and low temperature resistance and performance. Good mechanical properties. Organosiloxane modified water-based polyurethane can not on...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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