Positioning system and positioning device applied to large-aperture optical system

Abstract

The invention discloses a positioning device applied to a large-aperture optical system. The positioning device comprises a first limiting plate, a second limiting plate, a positioning base, an elastic driving part and a damping buffer part. The first limiting plate and the second limiting plate are oppositely and fixedly arranged; the elastic driving part is abutted against the positioning base elastically; and the damping buffer part is fixedly connected with the positioning base. When the elastic driving part pushes the positioning base to move to a target position, the positioning base isabutted against a primary mirror and the primary mirror exerts a counter-acting force on the positioning base due to the gravity of the primary mirror; and the positioning base moves in a direction away from the target position by overcoming the elastic resistance and damping force simultaneously, so that the positioning base realizes dual buffering and the primary mirror is protected from being impacted by the positioning base. The elastic driving part pulls the positioning base to move away from the target position to eliminate the acting force applied to the primary mirror by the positioning base, so that the primary mirror is completely supported by the existing supporting mechanism. Therefore, with the positioning device applied to the large-aperture optical system, the repeated positioning precision of the primary mirror can be improved. In addition, the invention further discloses a positioning system comprising the positioning device applied to a large-aperture optical system.

Description

technical field [0001] The invention relates to the field of optical element auxiliary equipment, in particular to a positioning device applied to a large-diameter optical system. The present invention also relates to a positioning system applied to a large aperture optical system comprising the above positioning device. Background technique [0002] A large-aperture optical system usually includes a primary mirror and a support mechanism, and the support mechanism is used to support the primary mirror. In order for the primary mirror to have high working accuracy, the support mechanism needs to have high positioning accuracy. For example, the support mechanism including the optical axis and the mechanical axis needs to ensure that the optical axis and the mechanical axis can completely coincide when the primary mirror is integrated. [0003] During normal operation, the main mirror needs to be coated, and the coating of the main mirror will inevitably cause the movement of...

AI Technical Summary

Problems solved by technology

The existing positioning device usually includes a positioning block and a supporting spring connected with the positioning block. The positioning block relies on the elastic force of the supporting spring to resist the main mirror. Shock vibration, but due to the limited cushioning degree of the supporting spring, the positioning block still suffers from large shock vibration during the movement process, which easily affects the primary mirror, resulting in low repeat positioning accuracy of the primary mirror

[0006] In addition, after the primary mirror is positioned, the positioning block is still elastically against the primary mirror under the action of the supporting spring. Although the stiffness of the positioning block applied to the primary mirror is much smaller than the stiffness of the supporting mechanism, the positioning block supported by the supporting spring is still stable. The main mirror exerts a certain degree of force, and this force can hardly be eliminated. The main mirror cannot be completely supported by the supporting mechanism. In severe cases, the supporting force exerted by the positioning block may cause the mirror deformation of the main mirror to increase

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