Plasma equipment, semiconductor manufacturing method, and gas delivery source
A plasma and plasma antenna technology, applied in the field of plasma equipment, can solve the problems of increasing the complexity of manufacturing and producing integrated circuits, increasing the production efficiency, reducing the manufacturing cost, etc., and achieving the best sealing effect and the effect of eliminating leakage
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[0075]The implementation modes or examples disclosed below are used to illustrate or complete various technical features of the present invention, and the specific embodiments of the described elements and configurations are used to simplify the description of the present invention, so as to make the disclosure more thorough and complete. In order to fully convey the scope of this disclosure to those of ordinary skill in the art. Of course, the present disclosure can also be implemented in many different forms without being limited to the embodiments described below. For example, if it is described in the embodiment that a first feature is formed on or above a second feature, it may include that the above-mentioned first feature is in direct contact with the above-mentioned second feature, or may include Additional features are formed between the first feature and the second feature such that the first feature and the second feature are not in direct contact. In addition, the...
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