Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of photoprotective plant composition and its preparation method and application

A composition and light protection technology, which can be applied in the direction of drug combination, plant raw materials, skin care preparations, etc., can solve the problems of poor skin repair and resistance, poor sun protection effect, weak blue light absorption effect, etc., to achieve good anti-aging Oxidation, effect of remarkable scavenging effect

Active Publication Date: 2022-07-01
GUANGZHOU HUANYA COSMETIC SCI & TECH CO LTD
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The invention can absorb ultraviolet rays, but the sunscreen effect applied in cosmetics is poor, and the absorption effect on blue light is also weak
[0007] To sum up, the existing natural plant sunscreen skin care products have limitations in efficacy, and some only focus on the protection of ultraviolet rays, or only have the effect of anti-blue light and sunscreen synergistic effect, and they are not only effective in improving the skin's own protection. Less effective in repair and resistance

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of photoprotective plant composition and its preparation method and application
  • A kind of photoprotective plant composition and its preparation method and application
  • A kind of photoprotective plant composition and its preparation method and application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0068] This embodiment provides a photoprotective plant composition. The raw materials for the preparation of the plant composition include, by mass percentage, 35% of peony flowers, 20% of winter plum blossoms, 15% of saffron, 10% of Centella asiatica, 10% of cinnamon sticks and Cocoa seeds 10%.

[0069] Its preparation method comprises the following steps:

[0070] (1) Weigh 3.5g of peony flowers, 2.0g of wax plum blossoms, 1.5g of saffron, 1.0g of Centella asiatica, 1.0g of cassia twigs and 1.0g of cocoa seeds, dry, pulverize and sieve, with a mesh size of 100 meshes, to obtain plant meal;

[0071] (2) Add deionized water to the coarse powder, and the amount is 5 times the mass of the coarse powder. After stirring evenly, adjust the pH value to 4.5, and then add cellulase with a final concentration of 0.2 mg / mL and 0.08 mg / mL fruit Gelase, shake well and put it into a 50°C constant temperature water bath for enzymatic hydrolysis for 2h; then add 50g ethanol solution, imme...

Embodiment 2

[0074] This embodiment provides a photoprotective plant composition. The raw materials for the preparation of the plant composition include, by mass percentage, 20% of peony flowers, 30% of winter plum flowers, 20% of saffron, 5% of Centella asiatica, 10% of cinnamon sticks and Cocoa seeds 15%.

[0075] Its preparation method comprises the following steps:

[0076] (1) Weigh 2.0 g of peony flowers, 3.0 g of winter plum blossoms, 2.0 g of saffron, 0.5 g of Centella asiatica, 1.0 g of cassia twigs and 1.5 g of cocoa seeds, respectively, carry out drying and sieving, and the mesh number is 80 meshes to obtain a thick pink;

[0077] (2) Add deionized water to the coarse powder, and the amount is 6 times the mass of the coarse powder. After stirring evenly, adjust the pH to 5.0, and then add cellulase with a final concentration of 0.25 mg / mL and fruit with 0.1 mg / mL. Gelase, shake well and put it in a constant temperature water bath at 40°C for enzymatic hydrolysis for 3 hours; t...

Embodiment 3

[0080]This embodiment provides a photoprotective plant composition. The raw materials for the preparation of the plant composition include by mass percentage: 15% of peony flowers, 20% of winter plum flowers, 30% of saffron, 10% of Centella asiatica, 15% of cinnamon sticks and Cocoa seeds 10%.

[0081] Its preparation method comprises the following steps:

[0082] (1) Weigh 1.5 g of peony flower, 2.0 g of winter plum blossom, 3.0 g of saffron, 1.0 g of Centella asiatica, 1.5 g of cassia twig and 1.0 g of cocoa seeds, respectively, carry out drying and sieving, and the mesh number is 120 meshes to obtain a thick pink;

[0083] (2) Add deionized water to the coarse powder, and the amount is 7 times the mass of the coarse powder. After stirring evenly, adjust the pH value to 4.0, and then add cellulase with a final concentration of 0.3 mg / mL and 0.15 mg / mL fruit Gelase, shake well, put it into a 55 ℃ constant temperature water bath for enzymatic hydrolysis for 1 hour, then add ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a photoprotective plant composition and a preparation method and application thereof. The preparation raw materials of the plant composition include: peony flower, winter plum flower, saffron, centella asiatica, cassia twig and cocoa seed. The active components of the photoprotective plant composition of the present invention cooperate with each other to have a synergistic effect, and the protection range covers the wavelength regions of UVB, UVA and HEV. The composition of the invention can not only carry out photoprotection by absorbing ultraviolet rays, but also can remove a large number of active oxygen free radicals induced by blue light, and improve the resistance to external harmful light by improving the skin's own resistance and repair ability.

Description

technical field [0001] The invention belongs to the field of cosmetics, in particular to a plant composition, a preparation method and application thereof, and in particular to a photoprotective plant composition, a preparation method and application thereof. Background technique [0002] High-energy blue light High Energy Visible (HEV) is a region with a wavelength between 400-500nm, which is derived from sunlight, electronic products, artificial light sources, etc. In modern society, people use electronic products, including mobile phones, computers, etc. more and more frequently, and the problem of blue light pollution is becoming more and more serious. Moreover, high-energy blue light (HEV) can also cause damage to human skin. Scientific research has shown that blue light can stimulate the production of reactive oxygen species, which can cause cell damage. Sun protection has developed from the protection of sunlight to the protection of modern sunlight, electronic produ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A61K8/9794A61K8/9789A61K36/88A61Q17/04A61Q19/00A61P37/08A61P17/16
CPCA61K8/9789A61K8/9794A61Q17/04A61Q19/004A61K36/71A61K36/65A61K36/185A61K36/88A61K36/23A61K36/54A61P17/16A61P37/08A61K2800/84A61K2300/00
Inventor 陈佳龄孟潇陈庆生龚盛昭吴知情
Owner GUANGZHOU HUANYA COSMETIC SCI & TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com