Electrochemical machining method for formwork with multiple S-shaped runners and massive tiny pits
A processing method and serpentine technology, applied in the direction of electrochemical processing equipment, metal processing equipment, manufacturing tools, etc., can solve the problems affecting the stability of the flow field, the wake vortex cannot be eliminated, and unfavorable operation, so as to improve the processing quality and processing quality And the effect of improving processing efficiency and improving flow rate uniformity
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0044] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0045] see Figure 1-14 , the present invention provides a technical solution: a method for electrolytic processing of a large number of small pit templates with multiple serpentine channels, including a liquid inlet 1, a plurality of small serpentine channels 2 and a liquid outlet 5, and a plurality of small serpentine channels 2 is located between two metal plates, the liquid inlet 1 is located between the top inlets on the left side of the small serpentine flow ...
PUM
Property | Measurement | Unit |
---|---|---|
width | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com