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Multilayer film metrics using effective medium approximation

A technology of multi-layer film and medium, applied in the field of measurement of multi-layer film stack, can solve the problem of indirect characterization and so on

Active Publication Date: 2021-05-14
KLA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Multilayer film stacks such as but not limited to three-dimensional (3D) flash memory devices present particular challenges that can limit metrology throughput because each layer is typically not directly characterized

Method used

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  • Multilayer film metrics using effective medium approximation
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  • Multilayer film metrics using effective medium approximation

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Embodiment Construction

[0021] Reference will now be made in detail to the disclosed subject matter which is illustrated in the accompanying drawings. The invention has been particularly shown and described with respect to certain embodiments and specific features thereof. The embodiments set forth herein are to be regarded as illustrative and not restrictive. It will be readily apparent to those skilled in the art that various changes and modifications in form and details can be made without departing from the spirit and scope of the invention.

[0022] Embodiments of the invention relate to the metrology of multilayer film stacks based on the use of effective medium approximation (EMA) models to model multilayer film stacks having alternating layers of different film compositions.

[0023] Multilayer film stacks in semiconductor devices typically comprise a known number of repeating layers of defined composition. For example, a 3D flash memory device may include, but need not necessarily include,...

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Abstract

The present invention provides a metrology system comprising a controller coupled to a detector for generating detection signals based on reflections of an illumination beam from a multilayer film stack. The multilayer film stack may comprise one or more regions having a repeating pattern of two or more materials. The controller may model the region as having a region thickness and an effective dielectric constant value by using an effective medium model that relates the effective dielectric constant value of the region to a dielectric constant value and a volume fraction of a constituent material. A thick film of electrical constant value is used to generate a reflection model of the illumination beam. The controller may further use the regression of the detection signal based on the effective medium model to determine the values ​​of the region thickness and the volume fraction and further based on the film number, the region thickness, the volume fraction and the effective dielectric constant value to determine the average thickness value of the constituent material.

Description

[0001] Cross References to Related Applications [0002] This application asserts under 35 U.S.C. §119(e) the names Mark Allen NeilA, Mikhail Sushchik, and Nata Natalia Malkova is the inventor of U.S. Provisional Application No. 62 / 536,880, entitled "3D Flash Film Measurement Employing an Effective Media Approximation," which states The entire content of is incorporated herein by reference. technical field [0003] The present invention relates generally to film metrology and more particularly to the measurement of multilayer film stacks. Background technique [0004] Production lines often incorporate metrological measurements on representative samples and / or locations on the samples to monitor process variation and ensure that manufacturing remains within quality tolerances. Accordingly, metrology recipes defining the number, location, and frequency of metrology measurements are typically carefully designed to balance precision of metrology measurements, number of repre...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/06
CPCG01B11/0625G01N21/8851G01N21/956G01N2021/8438G01N2021/8883G01B2210/56G01B11/0641G01B11/0683B32B2309/72G01N21/39G01N21/95623G01N21/4788G01N2201/068G02B27/58G01N21/211
Inventor M·尼尔M·苏辛西科N·马尔科娃
Owner KLA CORP