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Tube plug for treatment tube, AND PROCESS UNIT

A processing unit and processing pipe technology, applied in the field of pipe plugs, can solve problems such as low steam pressure

Inactive Publication Date: 2020-03-17
CENTROTHEM PHOTOVOLTAICS AG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the low vapor pressure, depending on the circumstances, it may not be possible to avoid boron trioxide (B 2 o 3 ) condensation

Method used

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  • Tube plug for treatment tube, AND PROCESS UNIT
  • Tube plug for treatment tube, AND PROCESS UNIT
  • Tube plug for treatment tube, AND PROCESS UNIT

Examples

Experimental program
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Embodiment Construction

[0073] The directional indications used in the following description, such as up or down, left or right, are based on what is shown in the drawings and do not constitute any limitation, although preferred layouts are possible.

[0074] Figure 1 to Figure 3 A different view of a first embodiment of a processing unit 1 which is especially suitable for thermal processing of semiconductor substrates under negative pressure. As is well known to those skilled in the art, the processing unit generally consists of a processing tube unit 3, a closing unit 4 and other units not shown in detail (such as an air supply system, a negative pressure unit, a movement unit for the closing unit and a control unit) constitute.

[0075] From figure 2 and image 3 It can be seen most clearly from these sectional views that the processing tube unit 3 is generally composed of a processing tube 6 , a heating unit 7 , an insulating unit 8 , and an accommodating and carrying unit 9 . In a preferre...

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PUM

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Abstract

The invention provides a tube plug for a treatment tube, and the treatment tube is provided with a closed end and an open end, has a first inner diameter within a treatment region and a larger secondinner diameter adjacent to the open end. The treatment tube has a first abutment edge at the open end and a second abutment edge at a transition between the first and second inner diameters towards the open end. The tube plug has a first element having a first outer diameter greater than a second inner diameter of the treatment tube and comprising an annular abutment surface adapted to abut against a first abutment edge of the treatment tube. The pipe plug is provided with a cylindrical second element which comprises a first side wall and a bottom, wherein the first side wall and the bottom form a containing cavity. The first side wall has a second outer diameter less than a first inner diameter of the treatment tube, and a flange extending radially from the first side wall, the flange adapted to abut against a second abutment edge of the treatment tube. The invention further relates to a treatment unit comprising a treatment tube and a tube plug of the aforementioned type.

Description

technical field [0001] The invention relates to a tube plug, which is aimed at a processing tube for heat treating a substrate, especially a semiconductor substrate, under negative pressure, and to a tube plug for thermally treating a substrate, especially a semiconductor substrate, under negative pressure. Process unit containing process tubes and plugs for heat treatment. Background technique [0002] In various technical fields, substrates need to be thermally treated under negative pressure, wherein the processing chamber of the processing tube for accommodating the substrate needs to be thermally and pressure-isolated from the surrounding environment through a tube plug. Among them, there are various devices using various pipe plugs. [0003] An example of such a device suitable for doping and coating semiconductor materials at low pressure is described in DE 10 2007 063 363 A1, which will hereinafter be referred to as the initial publication. During the processing of...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B31/10
CPCC30B31/10H01L21/67109H01L21/67103H01L21/67126H01L21/67772
Inventor 亚历山大·皮耶邱拉尼克莱·兹卡久
Owner CENTROTHEM PHOTOVOLTAICS AG
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