Generation device of high-uniformity single-photon area light source
A generation device and uniformity technology, which is applied in the field of optoelectronic information, can solve the problem of no reliable method for simulating a single-photon surface light source, and achieve the effect of flexible and adjustable repetition frequency, flexible and adjustable frequency, and high uniformity
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[0039] The purpose of this embodiment is to use the high-uniformity single-photon surface light source generation device disclosed in the present invention to generate a single-photon surface light source with a wavelength of 1550 nm, and accurately calibrate it to 0.1 photons per pulse in a square area of 100 μm×100 μm on the target distance. Light intensity, to further illustrate the feasibility of the present invention.
[0040] The structure and attachment of its optical generating device figure 1 consistent, including:
[0041] ①Monochromatic pulse laser, the laser wavelength λ is 1550nm, the repetition frequency F adjustment range is 0Hz-100MHz, and the laser energy per pulse is 1.2pJ.
[0042] ②Optical attenuator, the transmission wavelength is 1550nm, the attenuation coefficient range is adjustable from 0 to -80dB, and the adjustment accuracy is 0.01dB.
[0043]③Collimating lens group, transmission wavelength 1550nm, output beam emission angle 0.02°, beam waist dia...
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