Radio frequency introduction device and semiconductor processing device

A technology for introducing devices and semiconductors, applied in semiconductor devices, sustainable manufacturing/processing, metal material coating processes, etc., can solve the problems of low process efficiency, poor safety and stability, poor process performance, etc. Efficiency, passivation improvement, safety and stability improvement
CN111139460AInactive Publication Date: 2020-05-12BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
13 Cites 2 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
Publication Date
2020-05-12
Estimated Expiration
Not applicable · inactive patent

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The embodiment of the invention provide a radio frequency introduction device and a semiconductor processing device. The radio frequency introduction device is used for introducing radio frequency toa cassette located inside a semiconductor process furnace, and comprises a supporting mechanism, a front radio frequency mechanism and a rear radio frequency mechanism. The supporting mechanism comprises a supporting rod, the first end of the supporting rod is connected with a furnace opening of the semiconductor process furnace, and the second end of the supporting rod is connected with the furnace tail of the semiconductor process furnace; the front radio frequency mechanism and the rear radio frequency mechanism are arranged on the supporting rod in parallel and used for bearing the cassette; the front radio frequency mechanism is arranged close to the first end of the supporting rod, and the rear radio frequency mechanism is arranged close to the second end of the supporting rod; and the front radio frequency mechanism is electrically connected with one end of the cassette, and the rear radio frequency mechanism is electrically connected with the other end of the cassette. According to the device, the radio frequency of the cassette is introduced in two directions, so that the current direction between positive and negative electrodes of the cassette in the semiconductor process furnace is changed, and then the uniformity and passivation effect of the process are improved.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The present application relates to the technical field of semiconductor processing, and in particular, the present application relates to a radio frequency introduction device and semiconductor processing equipment. Background technique

[0002] At present, solar cells are an important option to solve increasingly severe energy and environmental problems, and crystalline silicon cells have always occupied a pivotal market share in the entire photovoltaic industry due to their advantages in cost and efficiency. After years of research and development, people have realized that light management (Light Management) and passivation (Passivating) are effective ways to improve the efficiency of crystalline silicon cells. Generally speaking, light management is mainly the treatment of the light-receiving surface of the battery, including surface texturing and adding an anti-reflection film, thereby greatly improving the absorption of incident sunlight; Electr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More