Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mask, preparation method thereof and evaporation method

A technology of mask plate and support part, which is applied in the directions of vacuum evaporation plating, sputtering plating, ion implantation plating, etc., can solve the problems of evaporation deviation and color mixing, etc., to ensure flatness, improve evaporation yield, avoid sagging effect

Active Publication Date: 2020-05-19
BOE TECH GRP CO LTD
View PDF5 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The present invention aims at the local warping and wrinkling of the FMM caused by the local warping or sag of the F-Mask opening edge or the special-shaped opening under a uniformly distributed magnetic field strength during evaporation, so that the problem of evaporation deviation and color mixing occurs, and provides a solution. A kind of mask plate and its preparation method and vapor deposition method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask, preparation method thereof and evaporation method
  • Mask, preparation method thereof and evaporation method
  • Mask, preparation method thereof and evaporation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0047] Based on the above technical problems of the mask, this embodiment provides a mask, such as image 3 As shown, it includes a main body part 1 and a support part 2, the main body part 1 is arranged on the support part 2, and the area for vapor deposition of the support part 2 includes a plurality of opening areas 21, and at least part of the opening areas 21 are provided at least part of the edge There is a magnetic adjustment part 3 configured to adjust the magnitude of the magnetic adsorption strength of the support part 2 at a corresponding position.

[0048] Among them, the main part 1 refers to the precision metal mask (Fine MetalMask, FMM) used to define RGB (red, green and blue) sub-pixels, and the support part 2 refers to the support mask (FMM) used to block the non-evaporation area and support the FMM. -Mask). The area used for vapor deposition of the main body part 1 refers to the area corresponding to the entire substrate to be plated on the main body part 1,...

Embodiment 2

[0060] This embodiment provides a mask plate. The difference from Embodiment 1 is that each opening area of ​​the support part has at least one section of irregular edges with the same size and shape, and the irregular edges of each opening area are provided with Magnetic adjustment unit.

[0061] In this example, if Figure 5 As shown, each opening area 21 of the support part 2 has irregular rectangular edges with the same size and shape, and the edge lines of the four corners of each opening area 21 are arcs with the same curvature, and the four corner positions of each opening area 21 are set There are magnetic adjustment parts 3 with the same magnetic attraction strength.

[0062] Among them, since the four corners of each opening area 21 of the support part 2 are obviously less magnetic than other areas of the support part 2, the amount of sagging at the four corners of each opening area 21 is obviously different from other areas, affecting the main body flatness of the...

Embodiment 3

[0066] This embodiment provides a mask plate, which is different from Embodiment 1-2, such as Figure 8 As shown, the area for vapor deposition of the support part 2 includes at least two sub-areas, each sub-area is connected, and at least one opening area 21 is respectively arranged in each sub-area; the size of the opening area 21 in each sub-area is different. The shapes are similar; the irregular edges of the opening area 21 in each sub-area are respectively provided with magnetic force adjustment parts, the magnetic force of the magnetic force adjustment parts at different positions in the same sub-area is the same, and the magnetic force of the magnetic force adjustment parts in different sub-areas is the same. The adsorption strength is different.

[0067] Wherein, since the irregular edge of the opening area 21 in each sub-area on the support part 2 is obviously less than the magnetic adsorption strength in other areas of the support part 2, the irregular edge of the o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention provides a mask, a preparation method thereof and an evaporation method. The mask comprises a main body part and a supporting part, wherein the main body part is arranged on the supporting part; and an area for evaporation of the supporting part comprises a plurality of opening areas, at least part of edges of at least part of the opening areas are provided with magnetic force adjusting parts, and the magnetic force adjusting parts are configured to adjust the magnetic force adsorption strength of the supporting part at corresponding positions. According to the mask, by arrangingthe magnetic force adjusting parts, the magnetic force adsorption strength of the supporting part at the corresponding positions can be adjusted, so that the adsorption magnetic force between a magnetic plate in evaporation equipment and the whole edges or the local edges of the opening areas on the supporting part is greatly enhanced, therefore the edges of the opening areas on the supporting part are prevented from being greatly dropped during evaporation, then the fold drop and the local deformation of the main body part under the supporting action of the supporting part are reduced or avoided, and the evaporation yield is improved.

Description

technical field [0001] The invention belongs to the field of display technology, and in particular relates to a mask plate, a preparation method thereof, and an evaporation method. Background technique [0002] OLED (Organic Light Emitting Diode, Organic Light Emitting Diode) display screen, because of its advantages of self-illumination, high contrast, fast response time, low power consumption, etc., is considered to be the display device with the most development potential, and has become a leading technology in the field of display technology. mainstream development direction. [0003] Nowadays, the OLED screen market has broad prospects, and major manufacturers are actively developing and producing various OLED screens to meet market demand. At present, the luminescent material of AMOLED display is mainly evaporated onto the display substrate by using a fine metal mask. The mask plate used for the evaporation OLED screen consists of a precision metal mask plate (Fine M...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04C23C14/24
CPCC23C14/042C23C14/24
Inventor 沈阔
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products