Target material detection method

A detection method and target material technology, which is applied in the field of semiconductors, can solve problems such as the inability to accurately determine the content of non-metallic microparticles in metal targets

Inactive Publication Date: 2020-05-26
KONFOONG MATERIALS INTERNATIONAL CO LTD
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0005] The problem solved by the present invention is that the content of non-metallic microparticles inside the metal target cannot be accurately judged

Method used

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Embodiment Construction

[0027] It can be known from the background art that in the prior art, the amount of residues can only be roughly judged, but cannot be quantified, and the usability of the target material cannot be accurately judged.

[0028] Analysis shows that in the prior art, after the target material to be determined is melted by the corrosive liquid, a filter screen is used to filter the melted liquid, and the amount of residue on the filter screen is judged with the naked eye. The properties of the target are estimated.

[0029] In order to solve the above problems, the present invention provides a detection method for a target material, wherein the target material sample is dissolved in the detection corrosion solution, and the metal part inside the metal target material will be completely dissolved, but the non-metallic particles inside the target material will be completely dissolved. It is insoluble in the detection corrosive liquid; the particle size, quantity and distribution of m...

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Abstract

A target material detection method comprises the following steps: providing a target material sample; providing a detection corrosive liquid and a reference corrosive liquid; dissolving the target material sample in the detection corrosive liquid, so that the metal part in the metal target material is completely dissolved, but the non-metal particles in the metal target material are not dissolvedin the detection corrosive liquid; detecting the granularity, the quantity and the distribution of the micro-particles in the liquid by adopting a liquid micro-particle technology. The reference corrosive liquid and the detection corrosive liquid meet micro-particle technology detection conditions through a dilution means; according to the present invention, the reference corrosive liquid and thedetection corrosive liquid are added to detect the contents of the micro-particles in the reference corrosive liquid, and the content of the micro-particles in the reference corrosive liquid is adopted as the reference so as to accurately calculate the content of the micro-particles contained in the target material sample, such that the basis for the performance judgment of the target material sample can be provided.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a detection method for a target material. Background technique [0002] After the preparation process of the sputtering target is completed, it is necessary to test the performance of the target, because the purity of the target is an important basis for characterizing the quality of the target. [0003] After research, in the use of the target, the high-purity metal target will have an alarm that the Particle (micro-particle) is too high during the use of the target. If the Particle inside the target is too high, it will cause wafer defects and reduce the yield. Particles in target use are mainly caused by the inclusion of non-metallic particles in metal targets. Therefore, detecting the number and particle size distribution of non-metallic particles inside the material can effectively judge the performance of the target material. A common solution in the prior art is t...

Claims

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Application Information

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IPC IPC(8): G01N1/28G01N1/38G01N5/04
CPCG01N1/28G01N1/38G01N5/04
Inventor 姚力军潘杰王学泽曹欢欢
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
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