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Device capable of automatically washing carbon deposition of silicon carbide crystal growth furnace

An automatic cleaning and silicon carbide technology, which is applied in the direction of descaling devices, post-processing devices, furnaces, etc., to save time, reduce labor intensity, and reduce injuries

Inactive Publication Date: 2020-06-16
哈尔滨科友半导体产业装备与技术研究院有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The invention solves the defect problem of manual cleaning of the carbon deposit on the wall of the quartz tube at present

Method used

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  • Device capable of automatically washing carbon deposition of silicon carbide crystal growth furnace
  • Device capable of automatically washing carbon deposition of silicon carbide crystal growth furnace
  • Device capable of automatically washing carbon deposition of silicon carbide crystal growth furnace

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0027] Embodiment 1: Combining Figure 1-Figure 5 Describing this embodiment, a device for automatically cleaning carbon deposits in a silicon carbide crystal growth furnace according to this embodiment includes a lifting mechanism 1, a lifting mechanism tray frame 2, a tray 3, a bracket 4, a rotating motor 5, a coupling 6, Clamping mechanism 7 and scraper 9, the lifting mechanism tray 2 is installed on the lifting mechanism 1, the tray 3 is installed on the lifting mechanism tray frame 2, the tray 3 is installed with a bracket 4, and the bracket 4 is a cylindrical hollow body, The rotary motor 5 is installed in the cavity of the bracket 4, the driving end of the rotary motor 5 is connected with the coupling 6, the other end of the coupling 6 is connected with the clamping mechanism 7, and the clamping mechanism 7 is installed with a scraper 9, which scrapes the The plate 9 is in contact with the inner wall of the quartz tube 8 . First, fix the scraper 9 on the clamping mecha...

specific Embodiment approach 2

[0028] Specific implementation mode 2: Combining Figure 1-Figure 5 Describing this embodiment, a device for automatically cleaning carbon deposits in a silicon carbide crystal growth furnace according to this embodiment, the lifting mechanism 1 includes a lifting motor 1-1, a lifting motor coupling 1-2, a screw 1- 3. Silk nut 1-4, support table 1-5, slider 1-6, guide rail 1-7 and base 1-8, the driving end of the lift motor 1-1 is connected with the lift motor coupling 1-2, and the lift The other end of the motor coupling 1-2 is connected with a screw rod 1-3, the bottom of the support table 1-5 is installed with a screw nut 1-4, the screw nut 1-4 is sleeved on the screw rod 1-3, and the support table 1 The bottom sides of the -5 are provided with sliders 1-6, the sliders 1-6 are installed on the guide rails 1-7, and the guide rails 1-7 are installed on the base 1-8. In this way, the power of the lifting mechanism 1 comes from the lifting motor 1-1, and the lifting motor 1-1 ...

specific Embodiment approach 3

[0029] Specific implementation three: combination Figure 1-Figure 5 This embodiment is described. In this embodiment, a device that can automatically clean carbon deposits in a silicon carbide crystal growth furnace. The clamping mechanism 7 includes a clamping plate connecting shaft 7-1 and a clamping plate 7-2. The clamping plate 7-2 is provided with a There are two mounting holes 7-3, the splint 7-2 is fixed on the splint connecting shaft 7-1 by the splint fixing bolts 7-4, and the splint 7-2 is provided with a plurality of scraper mounting holes 9-1. The corresponding position of the plate 9 is also provided with a scraper mounting hole 9-1, and the scraper 9 is fixed on the clamping plate 7-2 by the scraper fixing bolt 7-6. In this way, the scraper 9 and the splint 7-2, the splint 7-2 and the splint connecting shaft 7-1 are all fixed by bolts, and this fixing method is very reliable, and the scraper 9 will not fall off due to excessive rotation speed, and This fixing me...

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PUM

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Abstract

The invention discloses a device capable of automatically washing carbon deposition of a silicon carbide crystal growth furnace, belongs to the technical field of silicon carbide crystal growth furnaces and aims to solve the problem existed when the pipe wall of a quartz tube of the crystal growth furnace. The device comprises a lifting mechanism, a lifting mechanism tray rack, a tray, a bracket,a rotary motor, a coupling, a clamping mechanism and a scraper, wherein the lifting mechanism tray rack is mounted on the lifting mechanism; the tray is connected with the lifting mechanism tray rack;the bracket is mounted on the tray and is a cylindrical hollow body; the rotary motor is mounted in a cavity of the bracket; the driving end of the rotary motor is connected with the coupling; the other end of the coupling is connected with the clamping mechanism; and the scraper is mounted on the clamping mechanism and fits the inner wall of the quartz tube. The device is simple in structure andconvenient to detach, avoids the situation that body hurt of a working staff is likely to cause when the inner wall of the quartz tube is manually cleaned; and compared with manual cleaning, the device can clean the inner wall of the quartz tube more thoroughly and is suitable for large-scale production.

Description

technical field [0001] The invention relates to a device capable of automatically cleaning carbon deposits in a silicon carbide crystal growing furnace, belonging to the technical field of silicon carbide crystal growing furnaces. Background technique [0002] The crystal growth furnace is a device for artificially synthesizing crystals. The growth of artificial crystals refers to the transformation of substances from gas phase, liquid phase and solid phase under certain conditions of temperature, pressure, concentration, medium, PH, etc. to form crystals of specific linear size. process. After the crystal growth furnace grows crystals, there will be volatile carbon deposits on the quartz tube wall of the equipment. If the furnace is not removed in time, it will affect the next crystal growth result. At present, the cleaning and cleaning of carbon deposits are all manual operations. The operator uses a sponge dipped in hydrofluoric acid to clean it little by little. When cl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F27D25/00C30B35/00C30B29/36
CPCF27D25/001C30B35/00C30B29/36
Inventor 赵丽丽谭希滨
Owner 哈尔滨科友半导体产业装备与技术研究院有限公司