A scanning nozzle cleaning tank and cleaning method

A technology for cleaning tanks and nozzles, applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., can solve problems such as difficulty in tank detection, inability to complete normal overflow or fast discharge, etc., to reach the tank body Reasonable layout, compact structure and low cost of use

Active Publication Date: 2021-08-31
JIANGSU LEUVEN INSTR CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, fluorine-containing plastics are hydrophobic. If they encounter a liquid with a slightly higher surface tension, such as a water-based solution, it will not be able to complete normal overflow or fast drainage in a small tank.
In addition, generally fluorine-containing plastics are non-transparent, and it is difficult to detect the liquid level of the tank

Method used

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  • A scanning nozzle cleaning tank and cleaning method
  • A scanning nozzle cleaning tank and cleaning method
  • A scanning nozzle cleaning tank and cleaning method

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Embodiment Construction

[0019] In order to make the purpose, technical solutions and advantages of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. It should be understood that the specific The examples are only used to explain the present invention, not to limit the present invention. The described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0020] In the description of the present invention, it should be noted that the orientation or positional relationship indicated by the terms "upper", "lower", "vertical" and "horizontal" are based on the orientation or positional relation...

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Abstract

The invention discloses a scanning nozzle cleaning tank and a cleaning method. The scanning nozzle cleaning tank includes: a tank body and an upper cover plate, the tank body and the upper cover plate are sealed by a corrosion-resistant sealing ring, the tank body is provided with at least four reagent storage tanks, and the upper cover plate is correspondingly The same number of nozzle inlets and outlets are provided, each of the reagent storage tanks is equipped with a liquid inlet, an overflow port and a liquid level sensor, and a liquid discharge port is provided at the bottom, and the liquid level sensor is used to detect the liquid level of the reagent in the reagent tank. Whether the bit is empty or full. The tank body layout of the present invention is more reasonable, the structure is more compact, and the use cost is also lower. At the same time, the occurrence of pollution can be effectively reduced, and a set of reasonable use methods can be provided to increase production capacity.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a scanning nozzle cleaning tank and a cleaning method. Background technique [0002] Driven by Moore's Law, the 14nm generation of high-performance, low-power devices dominated by FinFETs (Fin Field Effect Transistors) has already entered our lives, but few people know that a large number of new chemicals need to be introduced to manufacture such powerful devices. Elements, fewer people know that because the introduction of "new" elements has made it extremely difficult to monitor the pollution of chip processing plants. Because each element has different effects on silicon-based devices, some must be added to achieve functions, and some are unintentionally introduced to reduce or kill the pollution source of the device, so all possible elements must be strictly monitored. In the periodic table of elements, metal elements account for the majority, and their active chemica...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B3/08B08B3/02B08B13/00
CPCB08B3/02B08B3/08B08B13/00
Inventor 邹志文侯永刚朱磊徐康宁崔虎山胡冬冬陈璐许开东
Owner JIANGSU LEUVEN INSTR CO LTD
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