Maskless photoetching system and image surface focus real-time detection method

A maskless lithography and lithography technology, applied in the field of lithography, can solve problems affecting the yield of the production process, defocused imaging, and decreased focus accuracy

Pending Publication Date: 2020-07-07
ZHONGSHAN AISCENT TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

As a result, the work efficiency has been greatly affected and the production efficiency of the equipment has been reduced.
In addition, if during the production process of substrate etching between two focusing times, if the focusing accuracy drops or defocused imaging is caused by system disturbance, it will not be possible to detect and adjust in real time
This will seriously affect the yield of the production process

Method used

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  • Maskless photoetching system and image surface focus real-time detection method
  • Maskless photoetching system and image surface focus real-time detection method
  • Maskless photoetching system and image surface focus real-time detection method

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Embodiment Construction

[0048] The present invention will be described in detail below in conjunction with the accompanying drawings and embodiments.

[0049] As shown in the figure, the maskless lithography system according to an embodiment of the present invention includes: a DMD module 101 , an illumination module 102 , a spectroscopic mirror group 103 , a focal plane detection camera module 104 and a lithography lens 105 . DMD module 101, lighting module 102, spectroscopic mirror group 103, focal plane detection camera module 104 and lithography lens 105 all can adopt any suitable structure, size and mode of operation, can be a single part, also can be many components composed of parts.

[0050] The DMD module 101 is used to emit light beams to form specific patterns. Usually the DMD module 101 is controlled by a control system to form a specific pattern; it can also have a control system itself. see Figure 5 , the DMD module 101 has a first area 101-1 for lithographic imaging, and a second a...

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Abstract

The invention discloses a maskless photoetching system and an image surface focus real-time detection method. The maskless lithography system comprises: a DMD module (101); an illumination module (102) is used for projecting a light beam to the first region (101-1) used for photoetching imaging and the second region (101-2) used for projecting an image surface detection graph of the DMD module (101); a light splitting reflector group (103), a focal plane detection camera module (104) and a photoetching lens (105), wherein the light beam reflected by the DMD module (101) is projected to an exposure substrate (106) coated with a photosensitive material through the light splitting reflector group (103) and the photoetching lens (105); the light is reflected by the exposure substrate and returns to the light splitting reflector set, the light splitting reflector set reflects the light to the focal plane detection camera module, and the focal plane detection camera module judges whether theposition of the exposure substrate is out of focus or not at the moment according to the quality of the collected image.

Description

technical field [0001] The invention relates to the technical field of photolithography, in particular to a maskless photolithography system and a method for real-time detection of an image plane focus. Background technique [0002] The digital maskless lithography technology based on digital micromirror array (Digital Micro-mirror Device, DMD) spatial light modulator greatly simplifies the tedious process of traditional photolithography mask manufacturing process, making the production of new digital photolithography masks easier. It is simple and easy to control, which significantly increases the complexity of lithography patterns, and further improves the precision and efficiency of lithography. [0003] DMD digital maskless lithography systems are mature state-of-the-art technologies such as figure 1 As shown, its basic structure includes a light source 1 , a DMD spatial light modulator 2 , a transflective prism 3 , a projection lens 4 and a CCD focusing camera 6 . The...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70641
Inventor 徐珍华李源汪孝军阮立锋
Owner ZHONGSHAN AISCENT TECH
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