Once chemical bath tank and liquid replacing method thereof

A one-time, chemical liquid technology, applied in chemical instruments and methods, cleaning methods using liquids, cleaning methods and utensils, etc. time-consuming, reduced usage, and improved spillover efficiency

Inactive Publication Date: 2020-07-14
HUA HONG SEMICON WUXI LTD
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The ONB tank is widely used in the advanced process cleaning process due to its good cleaning effect and low risk of cross-contamination. However, the chemical solution used in it cannot be reused. time consuming

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Once chemical bath tank and liquid replacing method thereof
  • Once chemical bath tank and liquid replacing method thereof
  • Once chemical bath tank and liquid replacing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] The technical solutions in this application will be clearly and completely described below in conjunction with the accompanying drawings. Apparently, the described embodiments are part of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of this application.

[0034] In the description of this application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, use a specific orientati...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a once chemical bath tank and a liquid replacing method thereof and relates to the field of semiconductor fabrication. The once chemical bath tank at least comprises a tank body and a baffle plate, wherein the side wall of the tank body is provided with a plurality of rows of liquid discharging mouths, the liquid discharging mouths are used for discharging liquid inside thetank body out, and the baffle plate is arranged on the outer side of the tank body and is used for closing or opening the liquid discharging mouths. By means of the once chemical bath tank and the liquid replacing method thereof, the problems that existing ONB (Once Chemical Bath) tanks are long in time consuming and large in liquid consumption quantity in replacing the liquid inside the tanks are solved, and the effects that the time consumed for liquid replacement is reduced and the replacement liquid use quantity is reduced are achieved.

Description

technical field [0001] The application relates to the field of semiconductor manufacturing, in particular to a disposable chemical bath and a liquid changing method thereof. Background technique [0002] In the front-end process and back-end process of the wafer, the wafer needs to go through multiple cleaning steps to remove the photoresist, etching residue, metal particles, etc. on the surface of the wafer through cleaning. [0003] In the ONB (Once Chemical Bath, disposable chemical bath) system, the bottom of the ONB tank is connected to the chemical agent tank and the pure water supply end through the mixing valve and pipeline. When it is necessary to clean the wafer, inject the required chemical liquid into the ONB tank from the bottom of the tank body. After the wafer cleaning is completed, inject pure water into the ONB tank from the bottom of the tank body, and use the method of overflowing from the top of the tank body , so that pure water instead of chemical liqu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B08B3/08B08B13/00H01L21/67
CPCB08B3/08B08B13/00H01L21/67023H01L21/67057
Inventor 宋振伟刘宁
Owner HUA HONG SEMICON WUXI LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap