Multi-path high-precision high-voltage power supply

A high-voltage power supply and negative high-voltage power supply technology, applied in the field of electron sources, can solve the problem of no high-voltage power supply, and achieve the effects of convenient heat treatment and stable focusing performance

Pending Publication Date: 2020-07-24
CHINA ELECTRONIC TECH GRP CORP NO 38 RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is no corresponding and convenient high-voltage power supply for the application scenario where the electron lens is an electrostatic lens, the electron beam emission is a field emission type, and the source center has a single bright spot.

Method used

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  • Multi-path high-precision high-voltage power supply
  • Multi-path high-precision high-voltage power supply
  • Multi-path high-precision high-voltage power supply

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Such as figure 1 , figure 2 As shown, this embodiment provides a technical solution: a multi-channel high-precision high-voltage power supply, including:

[0027] The high-precision high-voltage power supply 6 includes a first high-voltage power supply 61, a second high-voltage power supply 62, a third high-voltage power supply 63, and a low-voltage power supply 64. Among them, the second high-voltage power supply 62, the second high-voltage power supply 62, and the low-voltage power supply The power sources 64 are all suspended above the first sub-high voltage power source 61.

[0028] Such as figure 1 As shown, the second sub-high-voltage power supply 62 and the second sub-high-voltage power supply 62 are directly suspended above the first sub-high-voltage power supply 61, and the output voltage and current can be monitored for all three.

[0029] The low-voltage power supply 64 is suspended above the first sub-high-voltage power supply 61 connected to the protection resist...

Embodiment 2

[0035] Such as image 3 , Figure 4 As shown, the high-precision high-voltage power supply includes at least 4 branch power supplies, except for the first sub-high-voltage power supply 61, the second sub-high-voltage power supply 62, the third sub-high-voltage power supply 63, and the low-voltage power supply 64 in the first embodiment. It may also include a fourth sub-high-voltage power supply, such as a negative high-voltage power supply 65, suspended on the first sub-high-voltage power supply 61 as the power supply for the compression pole 7 to adjust the electron beam emission angle.

[0036] The high-precision high-voltage power supply 6 is connected to the controlled micro-focus X-ray source 1 through a dedicated high-voltage cable and a high-voltage plug, and the micro-focus X-ray source 1 is placed in a vacuum chamber, such as Figure 4 Shown. The first divided high-voltage power supply 61 and the low-voltage power supply 64 are connected to both ends of the filament 2, ...

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Abstract

The invention discloses a multi-path high-precision high-voltage power supply, which belongs to the technical field of electron sources. The power supply comprises at least four branch power supplieswhich are respectively a first sub-high-voltage power supply, a second sub-high-voltage power supply, a third sub-high-voltage power supply and a low-voltage power supply. The second sub-high-voltagepower supply, the third sub-high-voltage power supply and the low-voltage power supply are connected with the selected first sub-high-voltage power supply and are suspended on the first sub-high-voltage power supply. The first sub-high-voltage power supply and the low-voltage power supply are respectively connected with two ends of a lamp filament of the micro-focus X-ray source. The second sub-high-voltage power supply and the third sub-high-voltage power supply are respectively connected with two groups of electrodes of the micro-focus X-ray source to form an electrostatic lens. According tothe invention, each branch power supply can be accurately controlled, so that accurate control of electron beams emitted by the micro-focus X-ray source is realized.

Description

Technical field [0001] The invention relates to the technical field of electron sources, in particular to a multi-channel high-precision high-voltage power supply. Background technique [0002] Microfocus X-ray sources are widely used in the field of non-destructive testing. The X-rays emitted by the X-rays penetrate the tested sample and are imaged on the detector to generate the internal tissue structure of the tested object and realize the defect detection of the tested object. The microfocus X-ray source has a small focus and high imaging resolution, which can realize high-definition imaging of the detection object. [0003] Generally, the microfocus X-ray source is composed of a cathode (filament) and an electromagnetic lens. At present, most of the high-voltage power supplies used for microfocus X-ray sources on the market are composed of one high-voltage power supply and one filament power supply, and the electron beam focusing is completed by a magnetic lens. However, for...

Claims

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Application Information

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IPC IPC(8): H01J35/02
CPCH01J35/025
Inventor 胡贤斌陈迪志周自顾王鹏李嘉欣王翠珍王帅徐松刘华荣李光辉
Owner CHINA ELECTRONIC TECH GRP CORP NO 38 RES INST
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