Developing equipment

Abstract

The invention discloses developing equipment. The developing equipment comprises at least one supporting block abutting against a side wall of a substrate, wherein each supporting block comprises a composite curved surface and a first plane, the composite curved surface is composed of a first concave curved surface, a tip end and a second concave curved surface which are sequentially and smoothlyconnected, the tip end comprises a first surface, a contact surface and a second surface which are sequentially and smoothly connected, the first surface is smoothly connected with the first concave curved surface, the contact surface is used for contacting one side wall of the substrate, the first surface is smoothly connected with the second concave curved surface, an absolute value of the slopeof a tangent plane at any position of the first surface and the second surface in the extending direction of the side wall of the substrate is greater than 1, in the process that the first concave curved surface extends to the first plane from the tip end, the curvature of the first concave curved surface is gradually reduced, and in the process that the second concave curved surface extends to the first plane from the tip end, the curvature of the second concave curved surface is gradually reduced. The developing equipment is advantaged in that by utilizing the smooth effect of the compositecurved surface of the supporting block, the developing liquid does not flow back to cause an over-developing phenomenon when flowing through the supporting block.

Description

technical field [0001] The present application relates to the technical field of developing, in particular to a developing device. Background technique [0002] In the prior art, a development process of a Puddle development mode (coating development mode), before entering the development process, the substrate entering the development device has been pre-coated with PR (photoresist) and has undergone exposure treatment; The developing process includes: in the developing chamber, use a spraying device to evenly spray the developing solution on the substrate, wherein the flow direction of the developing solution in the spraying device is perpendicular to the moving direction of the substrate; The substrate is tilted at 15°, and the substrate is sprayed with deionized water (DI Water) from a spraying device to remove the developer on the substrate. Wherein, in the process of spraying and dumping the deionized water after the developer solution is applied, in order to fix the ...

AI Technical Summary

Problems solved by technology

However, in the process of deionized water spraying and dumping, due to the blocking effect of the circular stopper, the developer will flow back at the abutment between the existing substrate and the circular stopper. In the opposite direction of the speed in the vertical direction, the developer will stagnate around the circular stopper, which is prone to overdevelopment (mura)

Images