Photomask, touch module, preparation method of touch module, and electronic equipment

Abstract

The invention relates to a photomask, a touch module, a preparation method of the touch module, and electronic equipment. The photomask comprises a light blocking area, a light transmitting area and apartial light transmitting area, wherein the partial light transmitting area protrudes out of the edge of the light blocking area to allow partial ultraviolet transmission, the partial light transmitting area comprises a first partial light transmitting area and a second partial light transmitting area, the first partial light transmitting area is positioned on the edge of the light blocking area, the ultraviolet transmittance of the first partial light transmitting area is equal everywhere, the second partial light transmitting area is positioned on one side, far away from the light blockingarea, of the first partial light transmitting area, and has gradually-changed ultraviolet transmittance, the partial light transmitting area enables exposure energy to be small, only the dry film onthe surface layer is developed when the dry film is developed, the first partial light transmitting area is close to the light blocking area and forms smooth transition under the erosion of a developing solution, the second partial light transmitting area is far away from the light blocking area and forms an opening so as to facilitate subsequent etching, and a via hole and an ITO circuit in smooth transition are formed during etching, so that the phenomena of lateral etching and excessive etching are improved, and the visual effect and the product yield are improved.

Description

Technical field [0001] The invention relates to the field of display technology, in particular to a photomask, a touch control module, a preparation method thereof, and electronic equipment. Background technique [0002] In the field of display technology, ITO (Indium Tin Oxide), as a nano-indium tin metal oxide, has good conductivity and transparency. The substrate including the ITO layer is widely used in various display devices due to its high conductivity and high transparency. in. [0003] The preparation of the existing substrates usually adopts the process of film formation-shading-exposure-development-etching-removal. A multilayer film is formed on the substrate, and a photomask is set on the multilayer film, and then an exposure machine is used. The parallel ultraviolet light is exposed to lithography dry film to form the required pattern, and the excess pattern is removed with a developer, and then the circuit without dry film protection is etched with the etching soluti...

AI Technical Summary

Problems solved by technology

[0004] Based on this, it is necessary to provide a photomask, a touch module and its preparation method, and an electronic device for the problems of poor visual effect and low product yield of the existing ITO circuit.

Images