The invention relates to a
photomask, a touch module, a preparation method of the touch module, and
electronic equipment. The
photomask comprises a light blocking area, a light transmitting area and apartial light transmitting area, wherein the partial light transmitting area protrudes out of the edge of the light blocking area to allow partial
ultraviolet transmission, the partial light transmitting area comprises a first partial light transmitting area and a second partial light transmitting area, the first partial light transmitting area is positioned on the edge of the light blocking area, the
ultraviolet transmittance of the first partial light transmitting area is equal everywhere, the second partial light transmitting area is positioned on one side, far away from the light blockingarea, of the first partial light transmitting area, and has gradually-changed
ultraviolet transmittance, the partial light transmitting area enables
exposure energy to be small, only the dry film onthe
surface layer is developed when the dry film is developed, the first partial light transmitting area is close to the light blocking area and forms smooth transition under the
erosion of a developing solution, the second partial light transmitting area is far away from the light blocking area and forms an opening so as to facilitate subsequent
etching, and a via hole and an ITO circuit in smooth transition are formed during
etching, so that the phenomena of lateral
etching and excessive etching are improved, and the visual effect and the product yield are improved.