Unlock instant, AI-driven research and patent intelligence for your innovation.

A method for preparing crystalline transparent aluminum oxide film by sputtering at room temperature

A technology of aluminum oxide and crystalline state, which is applied in the field of room temperature sputtering to prepare crystalline transparent aluminum oxide film, can solve the problems of high cost, difficult process control, high deposition temperature, etc., achieve huge economic and social benefits, solve high deposition temperature, The effect of guaranteeing process stability and repeatability

Active Publication Date: 2021-12-24
INST OF MECHANICS CHINESE ACAD OF SCI
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The embodiment of the present invention provides a method for preparing a crystalline transparent aluminum oxide film by sputtering at room temperature, which solves the problems of high deposition temperature, difficult process control and high cost in the existing preparation technology

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method for preparing crystalline transparent aluminum oxide film by sputtering at room temperature
  • A method for preparing crystalline transparent aluminum oxide film by sputtering at room temperature
  • A method for preparing crystalline transparent aluminum oxide film by sputtering at room temperature

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] Embodiment 1, this embodiment is a method for preparing a crystalline transparent aluminum oxide film by sputtering at room temperature, comprising the following steps:

[0033] Step 100, pretreatment: cleaning the substrate and the vacuum chamber of the coating equipment. This step specifically includes:

[0034] Step S101, substrate cleaning: pre-treat the flexible substrate to remove surface grease, dirt and impurities; in a vacuum chamber.

[0035] Step S102, air path cleaning: pumping the air pressure of the vacuum chamber to 1.0×10 -3 Below Pa, pass argon and oxygen into the vacuum chamber to clean the gas path.

[0036]Step S103, ion source bombardment cleaning: close the front baffle of the cathode target, and open the ion source baffle. Introduce high-purity argon gas into the vacuum chamber, and use ion source gas glow discharge to clean for 15-60 minutes.

[0037] Set the power supply to 5-6kW, and the current to 3-8A; set the Ar gas flow to 200-350sccm ...

Embodiment 2

[0060] This embodiment is a method for preparing a crystalline transparent aluminum oxide film by sputtering at room temperature. In this embodiment, a crystalline transparent aluminum oxide film is prepared with a set value of Al content of 40%, and the method includes the following steps:

[0061] (1) Pretreatment

[0062] (1) Substrate cleaning: The flexible substrate polyethylene terephthalate (PET) is pretreated to remove surface grease, dirt and impurities; After cleaning and drying, put it into the vacuum chamber of the coating equipment.

[0063] (2) Gas path cleaning: pump the air pressure of the vacuum chamber to 1.0×10 -3 Below Pa, pass argon and oxygen into the vacuum chamber to clean the gas path.

[0064] (3) Ion source bombardment cleaning: close the front baffle of the cathode target and open the ion source baffle. Introduce high-purity argon gas into the vacuum chamber, and use ion source gas glow discharge to clean for 20 minutes.

[0065] Set the power s...

Embodiment 3

[0082] This embodiment is a method for preparing a crystalline transparent aluminum oxide film by sputtering at room temperature. In this embodiment, a crystalline transparent aluminum oxide film is prepared with a set value of Al content of 50%, including the following steps:

[0083] (1) Pretreatment

[0084] (1) Substrate cleaning: pre-treat the flexible substrate polymethyl methacrylate (PMMA) to remove surface grease, dirt and impurities; then ultrasonically clean it in deionized water, absolute ethanol, and deionized water , and put it into the vacuum chamber of the coating equipment after drying.

[0085] (2) Gas path cleaning: pump the air pressure of the vacuum chamber to 1.0×10 -3 Below Pa, pass argon and oxygen into the vacuum chamber to clean the gas path.

[0086] (3) Ion source bombardment cleaning: close the front baffle of the cathode target and open the ion source baffle. Introduce high-purity argon gas into the vacuum chamber, and use ion source gas glow d...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
adhesivityaaaaaaaaaa
thicknessaaaaaaaaaa
friction coefficientaaaaaaaaaa
Login to View More

Abstract

The embodiment of the present invention relates to a method for preparing a crystalline transparent aluminum oxide film by sputtering at room temperature, which solves the problems of high deposition temperature, difficult process control, and high cost in the existing preparation technology, and ensures the process of industrial production. stability and repeatability. At the same time, flexible crystalline films show great advantages in terms of mechanics and broadband optical transmission properties, and can be better used for surface protective coatings and transparent protective films for infrared windows, bringing huge economic and social benefits.

Description

technical field [0001] The embodiments of the present invention relate to the field of preparation of crystalline thin film materials, in particular to a method for preparing a crystalline transparent aluminum oxide thin film by sputtering at room temperature. Background technique [0002] Alumina (Al 2 o 3 ) thin film is a new type of Ⅲ-Ⅵ wide bandgap semiconductor functional material, which has excellent physical and chemical properties such as light transmission, chemical stability, insulation, high temperature resistance and high hardness, so it is used in machinery, optics, microelectronics , medicine, chemical industry and many other fields have a wide range of applications. Compared with the amorphous state, the crystalline aluminum oxide film has better mechanical properties and wide-band optical transmission properties, and can be better used for surface protective coatings and transparent protective films for infrared windows. [0003] There are many techniques ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/08C23C14/02
CPCC23C14/35C23C14/081C23C14/0036C23C14/022
Inventor 夏原高方圆李光
Owner INST OF MECHANICS CHINESE ACAD OF SCI