High-temperature-resistant corona-resistant ceramic membrane covered wire and preparation method thereof
A technology of corona resistance and ceramic film, which is applied in the field of electromagnetic wire, can solve the problems of poor corona resistance, high temperature resistance, high temperature resistance and corona resistance, etc.
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Embodiment 1
[0037] A flat aluminum wire whose outer surface is an aluminum base is grown in-situ on the surface of the aluminum base by a micro-arc oxidation method, and then an organic insulating material is used to coat the outer surface of the ceramic layer by winding to form an organic insulating layer.
[0038] The steps are:
[0039] Modulated silicate system: 20% Na 2 SiO 3 , 25% NaClO 3 , 5% kOH solution;
[0040] Pass the flat aluminum wire whose outer surface is aluminum-based through the plating pool filled with the above electrolyte solution, and control the moving speed of the flat aluminum wire to 1.5m / min, so that the time of the flat aluminum wire in the plating pool is 80-120 seconds, and the temperature is 25°C;
[0041] The power supply of the plating pool adopts the constant current mode of the bidirectional asymmetric pulse power supply, and the applied current density is 5A / mm 2 The current and voltage change with the resistance of the flat aluminum wire;
[00...
Embodiment 2
[0053] A flat aluminum wire with an aluminum-based outer surface is grown on the surface of the aluminum-based flat aluminum wire by micro-arc oxidation, and then an organic insulating material is used to coat the outer surface of the ceramic layer by cladding to form an organic insulating layer.
[0054] The steps are:
[0055] Modulation electrolyte system: oxalic acid 0.3mol / L, ethylene glycol 50% (volume) aqueous solution;
[0056] Pass the flat aluminum wire whose outer surface is aluminum-based through the plating pool filled with the above electrolyte solution, and control the moving speed of the flat aluminum wire to 0.5m / min, so that the flat aluminum wire stays in the plating pool for 200-300 seconds and the temperature is 26°C;
[0057] The bidirectional asymmetric pulse power supply of the plating tank adopts constant current mode, and the applied current density is 1.5A / mm 2 The current and voltage change with the resistance of the flat aluminum wire;
[0058] ...
Embodiment 3
[0067] A round aluminum wire whose outer surface is an aluminum base is grown in-situ on the surface of the aluminum base by a micro-arc oxidation method, and then an organic insulating material is used to coat the outer surface of the ceramic layer by coating to form an organic insulating layer.
[0068] The steps are:
[0069] Modulated silicate system: 10% Na 2 AlO 2 , 15% NaClO 3 , 6% kOH solution;
[0070] Pass the aluminum-based round aluminum wire on the outer surface through the plating pool filled with the above electrolyte solution, and control the moving speed of the round aluminum wire to 0.8m / min, so that the round aluminum wire stays in the plating pool for 150-225 seconds and the temperature is 20°C;
[0071] The plating tank power supply adopts the constant current mode of bidirectional asymmetric pulse power supply, and the applied current density is 3A / mm 2 The current and voltage change with the resistance of the round aluminum wire;
[0072] The round...
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Abstract
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