Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method of porous silicon graphene quantum dot composite drug-loaded particles, wound dressing, preparation method and application of wound dressing

A graphene quantum dot and wound dressing technology, applied in the field of new medical materials, can solve problems such as short half-life and unstable polypeptide drugs, and achieve the effects of reduced wound area, good synergistic promotion, and high-efficiency loading

Active Publication Date: 2021-08-10
ZHEJIANG UNIV
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The market needs a nano drug-loaded material that can solve the instability and short half-life of polypeptide drugs in biological systems.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of porous silicon graphene quantum dot composite drug-loaded particles, wound dressing, preparation method and application of wound dressing
  • Preparation method of porous silicon graphene quantum dot composite drug-loaded particles, wound dressing, preparation method and application of wound dressing
  • Preparation method of porous silicon graphene quantum dot composite drug-loaded particles, wound dressing, preparation method and application of wound dressing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0047] The present invention will be specifically introduced below in conjunction with the accompanying drawings and specific embodiments.

[0048] A porous silicon / graphene quantum dot composite drug-loaded particle is manufactured according to the following steps, the process includes: preparing a porous silicon / graphene quantum dot composite particle, and then preparing a porous silicon / graphene quantum dot composite drug-loaded particle.

[0049] First, the preparation process of porous silicon / graphene quantum dot composite particles is as follows:

[0050] (1) After surface washing and pretreatment of single crystal silicon wafers, electrochemical etching, electrochemical stripping, and weak oxidation activation are performed to obtain porous silicon particles with fluorescent properties;

[0051] The specific process of electrochemical etching is as follows: the P-type boron-doped silicon wafer is fixed in the electrolytic cell as a single crystal silicon wafer, the ele...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a preparation method of a porous silicon graphene quantum dot composite drug-loaded particle, a wound dressing and a preparation method and application of the wound dressing. properties to achieve high-efficiency drug delivery, increase drug efficacy and validity period, and at the same time realize oxidative stimulus-responsive drug release and visual monitoring of reactive oxygen species in diabetic wounds; then porous silicon / graphene quantum dot composite drug-loaded particles are coated on biological A non-toxic flexible natural polymer gel is used to make a polymer wound dressing with both diagnostic and therapeutic effects. Through the synergistic effect of porous silicon / graphene quantum dot composite drug-loaded particles and polymer gel, the effect of accelerating wound healing can be achieved ; The present invention is expected to break through the clinical problem that diabetic wounds are difficult to heal, and facilitate self-health management and personalized diagnosis and treatment dressings for diabetic wound patients and wound patients with other diseases.

Description

technical field [0001] The invention relates to the field of new medical materials, in particular to a preparation method of porous silicon graphene quantum dot composite drug-loaded particles, a wound dressing, and a preparation method and application of the wound dressing. Background technique [0002] Diabetes is a metabolic disease caused by defective insulin secretion or impaired biological action. Chronic skin wounds or ulcers are one of the common complications of diabetes. The symptoms are persistent painful ulcers accompanied by disintegration of dermal tissue. Wounds It is difficult to heal for a long time, and there is a risk of long-term infection and even amputation. The normal wound healing process involves the synergy and dynamic balance of various signaling factors, which jointly regulate protein expression, cell migration, proliferation, and differentiation. However, there are abnormalities such as delayed immune response, impaired expression of various gro...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A61K9/51A61K47/04A61K38/28A61K38/18A61K31/722A61P3/10A61P17/02A61K49/00A61L15/18A61L15/20A61L15/32A61L15/28A61L15/42A61L15/44
CPCA61K9/5115A61K31/722A61K38/1808A61K38/28A61K49/0019A61L15/18A61L15/20A61L15/28A61L15/32A61L15/42A61L15/44A61L2300/236A61L2300/252A61L2300/412A61L2300/414A61L2300/602A61P3/10A61P17/02A61K2300/00C08L5/08
Inventor 邬建敏崔瑶轩段伟
Owner ZHEJIANG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com