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Side polishing process for LCD planar target material

A planar target and process technology, which is applied in the direction of surface polishing machine tools, grinding/polishing equipment, manufacturing tools, etc., can solve the problems of roughness without introduction, achieve stable roughness, increase turnover rate, and reduce defective products.

Pending Publication Date: 2020-10-16
合肥江丰电子材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The polishing process of the invention uses a polishing machine for polishing, but the polishing is to polish the main surface of the LCD display panel, and the side polishing and the roughness after polishing are not introduced.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] The side polishing process of the LCD planar target in this embodiment is as follows: apply the IPA solution to an 800# alumina scouring pad, and polish the side of the G8.5 split-type LCD planar aluminum target for 1 hour.

[0027] Wherein, the dosage of IPA solution is 80mL, and it is used three times, and the dosage is the same each time.

[0028] Using the polishing process of this embodiment, the polishing time is 1 h, the roughness after polishing is 2-3, and the product yield is 95%.

Embodiment 2

[0030] The side polishing process of the LCD planar target in this embodiment is as follows: apply the IPA solution to an 800# alumina scouring pad, and polish the side of the G8.5 split-type LCD planar aluminum target for 0.9h.

[0031] Among them, the dosage of IPA liquid is 90mL, and it is used three times, and the dosage is the same each time.

[0032] Using the polishing process of this embodiment, the polishing time is 0.9 h, the roughness after polishing is 2-3, and the product yield is 94%.

Embodiment 3

[0034] The side polishing process of the LCD planar target in this embodiment is as follows: apply the IPA solution to an 800# alumina scouring pad, and polish the side of the G8.5 split-type LCD planar aluminum target for 0.8h.

[0035] Wherein, the dosage of IPA liquid is 100mL, and it is used three times, and the dosage is the same each time.

[0036] Using the polishing process of this embodiment, the polishing time is 0.8 h, the roughness after polishing is 2-3, and the product yield rate is 95%.

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PUM

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Abstract

The invention discloses a side polishing process for an LCD planar target material. According to the side polishing process for the LCD planar target material, an IPA solution is applied to a scouringpad, and the side of the LCD planar target material is polished. The IPA solution is applied to the scouring pad and the side of the LCD planar target material is polished, so that the foreign matter, the copper rust and the non-target integrated substance on the side of the LCD planar target material are removed, the turnover rate of the target material polishing is improved, the manual operation time is reduced, the defective product is reduced, the roughness after polishing is stable, and the one-time pass rate is improved.

Description

technical field [0001] The invention relates to the technical field of target material processing, in particular to a side polishing process of an LCD plane target material. Background technique [0002] Nowadays, liquid crystal display (LCD) technology has been widely used in daily life, and there are many manufacturers of LCD products in China. However, the LCD targets used in production still need to be imported, and the automatic processing methods of LCD targets are also in the hands of others, especially the surface treatment technology of LCD targets. The progress of personnel processing is slow, and the quality is difficult to be guaranteed stably. [0003] At present, the impurities and foreign matter on the main surface of the LCD target are mainly removed by polishing with a polishing machine. However, for the removal of foreign matter, oxides, and non-target materials on the side of the LCD target, the existing polishing methods generally use manual sandpaper or ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B29/02B24B27/033
CPCB24B27/033B24B29/02
Inventor 姚力军窦兴贤王学泽王青松吴先帮
Owner 合肥江丰电子材料有限公司
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