Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Polishing device

A technology of polishing device and sliding device, which is applied in the direction of grinding/polishing equipment, machine tools for surface polishing, and parts of grinding machine tools. It can solve the problems of low polishing efficiency, easy to cut users, and low degree of automation, and achieve Improve polishing efficiency, avoid damage, and achieve high degree of automation

Inactive Publication Date: 2020-12-01
WUYI UNIV
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] After the kettle is processed, burrs will appear on the kettle, which is not beautiful and is easy to cut the user. Generally speaking, the kettle will be polished before it is sold to remove the burrs on the kettle. However, the existing polishing equipment is for the workpiece It clamps and drives the workpiece to rotate, and the rotating polishing wheel radially cuts in to polish the workpiece. During the entire polishing process, the disassembly, clamping and cutting of the polishing wheel all need to be manually operated, which has high labor intensity and high polishing efficiency. Low, low degree of automation, unable to meet production needs

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Polishing device
  • Polishing device
  • Polishing device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.

[0030] In the description of the present invention, it should be understood that the orientation descriptions, such as the orientation or positional relationship indicated by up, down, front, rear, outside, and inside, etc., are based on the orientation or positional relationship shown in the drawings, and are only In order to facilitate the description of the present invention and simplify the description, it does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a polishing device. The polishing device comprises a clamping mechanism, wherein the clamping mechanism comprises a clamping device and a first sliding device, the first slidingdevice is installed on a rack, and the clamping device is installed on the first sliding device in a sliding mode; a tower mechanism which comprises a first driving device, a tower turntable, a towerand a grabbing part, wherein the tower is mounted on the tower turntable, the grabbing part is movably mounted on the tower, and the grabbing part is used for grabbing a to-be-polished product; a grinding mechanism which comprises a polishing device body and a second sliding device, wherein the second sliding device is installed on the rack, the polishing device body is installed on the second sliding device in a sliding mode and used for polishing the to-be-polished product, the first sliding device and the second sliding device are used for adjusting the positions of the clamping mechanismand the grinding mechanism; and a control device electrically connected with the tower mechanism, the clamping mechanism and the grinding mechanism. In the whole polishing process, the tower mechanism, the clamping mechanism and the grinding mechanism are controlled by the control device to complete polishing, manual operation is not needed, the automation degree is high, and the polishing efficiency is improved.

Description

technical field [0001] The invention relates to a polishing device, in particular to a polishing device. Background technique [0002] After the kettle is processed, burrs will appear on the kettle, which is not beautiful and is easy to cut the user. Generally speaking, the kettle will be polished before it is sold to remove the burrs on the kettle. However, the existing polishing equipment is for the workpiece It clamps and drives the workpiece to rotate, and the rotating polishing wheel radially cuts in to polish the workpiece. During the entire polishing process, the disassembly, clamping and cutting of the polishing wheel all need to be manually operated, which has high labor intensity and high polishing efficiency. Low, low degree of automation, unable to meet production needs. Contents of the invention [0003] The present invention aims to solve at least one of the technical problems existing in the prior art. For this reason, the present invention proposes a poli...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B24B29/02B24B41/02B24B41/00B24B41/06
CPCB24B29/02B24B41/005B24B41/02B24B41/06
Inventor 陈邦印王建生
Owner WUYI UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com