A silicon chip patch removal method based on oil magnetic particle separation technology
A separation technology and magnetic particle technology, which is applied in the field of silicon wafer patch removal based on oil-magnetic particle separation technology, can solve the problems of strong randomness, insufficient degumming, and difficult and standardized operation of employees, so as to improve the cleanliness and reduce the viscosity. , the effect of improving the removal efficiency
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[0045] See figure 1 A method of removing the magnetic particles based on silicon oil patch separation techniques, comprising the steps of:
[0046] Sl, the semiconductor silicon patch affixed pre-processing, the wedge-shaped groove defines a circle surface of the patch, and the two doors are shaped to snap the plastic frame 1 the wedge groove, formed soaked sheet;
[0047] S2, prepare a hot soaking solution, and thereto is added a detection reagent, after mixing, the mixture was heated to 40 ℃, then soaked tablets were placed into the plurality of the mixed solution, stirred to be uniformly distributed soaked sheet;
[0048] S3, the sheet after soaking 50min soak extraction, and the outside of the door to form a plastic buckle housing 1, the semiconductor wafer cause the patch was separated and the plastic housing by means of a portal to a semiconductor wafer wiping, thus completing the posted piece removed.
[0049] See Figure 2-5 , Sl to the gate-shaped plastic frame has an oute...
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