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An anti-offset embroidery machine for double-layer fabric embroidery

An anti-offset and embroidery machine technology, which is applied to embroidery machines, embroidery machine mechanisms, textiles and papermaking, etc. It can solve the problems of inability to carry out continuous processing, inability to do anti-offset embroidery on double-sided fabrics, etc., and achieve accurate distance and convenience Regulates, reduces the effect of the driver

Active Publication Date: 2021-08-13
FUJIAN YONGXIN NUMERICAL CONTROL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] 1. Although this solution can sew fabrics, this solution can perform anti-offset embroidery on single-sided fabrics, but cannot perform anti-offset embroidery on double-sided fabrics
[0006] 2. Although this solution can carry out anti-offset embroidery, it cannot carry out continuous processing

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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  • An anti-offset embroidery machine for double-layer fabric embroidery
  • An anti-offset embroidery machine for double-layer fabric embroidery
  • An anti-offset embroidery machine for double-layer fabric embroidery

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Embodiment Construction

[0062] The technical solutions of the present invention will be further described below with reference to the accompanying drawings.

[0063] The drawings are for exemplary description, which is merely a schematic diagram, rather than the experiment, and is not to be understood to be in this patent; in order to better illustrate the embodiments of the invention, there will be omitted, Enlarge or shrink does not mean the size of the actual product.

[0064] Refer Figure 1 to 17 A bilateral fabric embroidery machine, including a scribe mechanism 1, a cutting mechanism 2, an upper cloth moving mechanism 4, a lower cloth moving mechanism 5, a lower pressure mechanism 7, a winding mechanism 8, double The layer upper body 9, the support frame 12, and the embroidery head 13, the support frame 12 is fixedly mounted on the ground, and the bilayer upper material for supplying the cloth is located on one side of the upper layer fabric 10 and is used in winding cloth. The winding mechanism 8 ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Abstract

The invention relates to the field of double-layer cloth embroidery, in particular to an anti-deviation embroidery machine for double-layer cloth embroidery, comprising a marking mechanism, a cutting mechanism, an upper cloth moving mechanism, a lower cloth moving mechanism, a lower pressing mechanism, and a winding mechanism , double-layer feeding machine, support frame and embroidery machine head, replacing the traditional winding and moving method, making the moving distance of the upper layer of fabric more accurate, making the moving mechanism of the lower fabric and the moving mechanism of the upper fabric move at the same time, reducing the working time and making The moving distance of the lower fabric moving mechanism and the upper fabric moving mechanism is in a certain proportion, so that the moving distance of the upper fabric and the lower fabric is in a certain proportion. The way of cloth prevents the deviation of double-layer cloth, and the marking and cutting are carried out at the same time, which saves the working time of the equipment, reduces the drive, and makes the moving distance a certain proportion, which is convenient for workers to adjust.

Description

Technical field [0001] The present invention relates to the field of double-layer cloth embroidery, and more particularly to a double-layer cloth embroidery machining anti-offset embroidery machine. Background technique [0002] The embroidery machine is often used to embroider the set of patterns on the fabric, while the conventional embroidery of the fabric is often used on the lower pad of the lower pad of the embroidery area, the hardness of the lower cloth is often hard The hardness of the cloth. [0003] my country's patent application number: CN202010006844.2; An embroidery machine discloses a cloth pressing device with an anti-offset structure, the base of the present invention is fixedly mounted on the support plate by bolts, is tight, because there is no need to replace it, When a material having a higher hardness is used, the shaking amplitude generated by the chassis of the end of the embroidery machine is reduced, and the pressing is always pulled by the electric pus...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): D05C9/00D05C13/00
CPCD05C9/00D05C13/00
Inventor 林少鹏林金练林春晓张贵能陈小斌
Owner FUJIAN YONGXIN NUMERICAL CONTROL TECH