Cleaning device suitable for roll-to-roll COF substrates and cleaning method of cleaning device

Abstract

The invention discloses a cleaning device suitable for roll-to-roll COF substrates and a cleaning method of the cleaning device. The cleaning device comprises a box body, wherein an inner cavity of the box body is sequentially divided into a feeding area, a cleaning area, a hot air drying area and a discharging area from left to right; a conductivity detection area is arranged on the lower portionof the cleaning area, and a plurality of feeding winding discs are rotationally supported in the feeding area; a pre-spraying area with a built-in spraying head is arranged in a left side area of theupper portion of the cleaning area, a water jet cutter spraying area with a built-in water jet cutter is arranged in a middle area of the upper portion of the cleaning area, and a two-fluid sprayingarea with a built-in two-fluid nozzle and a water removal area with a built-in air jet cutter are arranged in a right side area of the upper portion of the cleaning area; and an air heater is arrangedin the hot air drying area, a plurality of discharging winding discs are rotationally supported in the discharging area, and static electricity eliminators are fixed to the feeding area and the discharging area. According to the cleaning device suitable for the roll-to-roll COF substrates and the cleaning method of the cleaning device, carbon dioxide is used for increasing the electrification degree of water, then the cleaning capacity is improved, high-pressure fluid generated by the high-pressure water jet cutter and the two-fluid nozzle is used for primary and secondary physical flushing,and the cleaning effect is improved.

Description

technical field [0001] The invention relates to the technical field of COF substrate cleaning, in particular to a cleaning device and cleaning method suitable for roll-to-roll COF substrates. Background technique [0002] COF products are processed and formed on strip-shaped substrates, and are sent to customers after punching, photoresist coating, exposure, development, etching, stripping, tinning, printing, slitting, inspection, and shipment. COF customers often have high requirements for product cleanliness, so COF manufacturers will choose to add wet cleaning equipment in the shipping process to remove foreign matter. There is a conductive layer on the surface of the COF substrate, and a photoresist is coated on the surface of the conductive layer and dried to form a photoresist film. After being positioned through the external transfer hole, it is exposed with ultraviolet light and a film sheet, and developed to form a resist. Resist, etch to form a circuit pattern, re...

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Problems solved by technology

[0004] The existing COF substrate cleaning device has the problems of unreasonable cleaning system design and insufficient cleaning effect during use, which needs to be optimized and improved

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