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Ion milling device

A technology of ion milling and ion beam, which is used in the preparation of discharge tubes, electrical components, and test samples, etc.

Pending Publication Date: 2021-02-02
HITACHI HIGH-TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The principle of processing the sample of the FIB device is the same as that of the ion milling device, therefore, the FIB device also has the same problem when processing materials with imide bonds

Method used

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  • Ion milling device
  • Ion milling device
  • Ion milling device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] figure 1 The ion milling device according to Example 1 is shown. Example 1 is a structure suitable for face milling. Sample 3 is a sample containing a material having an imide bond, and is held in a vacuum atmosphere in vacuum chamber 6 , and its surface is processed by irradiating unfocused ion beam 2 from ion gun 1 . In this apparatus, in order to process a material having an imide bond, there is a water vapor supply mechanism for supplying water molecules as an assist gas together with irradiation of the ion beam 2 . In addition, in order to suppress scattering of water molecules from the vicinity of the sample processing surface of the sample 3 as much as possible, a sample container 18 is installed in the vacuum chamber 6 , and the sample 3 is placed on the sample holder 5 of the sample container 18 . The shape of the sample container 18 is not particularly limited, but it is a cylindrical container having at least an opening for passing the ion beam 2 on the upp...

Embodiment 2

[0044] Image 6 It is an ion milling device suitable for cross-section milling, and shows the vicinity of the sample container 18 . Image 6 parts not shown in the figure 1 same. A cross section of sample 3 was produced using a shielding plate 63 . The sample holder 61 is coupled to a swing shaft 72 via a coupling portion 64 , and the swing shaft 72 is coupled to a motor 71 . The motor 71 makes the swing shaft 72 take the central axis D as the center and rotates clockwise and counterclockwise according to the angle Make a swing. The central axis D extends in the horizontal direction, and is disposed at a position passing through the center of the sample holding portion 61 and at the same height as the upper surface of the sample 3 . An opening 62 is provided in the sample holder 61 . The sample 3 is placed on the sample holder 61 to protrude from the shielding plate 63 by a predetermined length, and the protruded portion of the sample 3 is located in the opening 62 of t...

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Abstract

The present invention obtains an ion milling device capable of performing high-speed milling processing even on a sample containing a material having an imide bond. Accordingly, the ion milling devicehas: a vacuum chamber 6 for holding a sample 3 in a vacuum atmosphere; an ion gun 1 for irradiating the sample with an unfocused ion beam 2; a vaporizing container 17 for storing a mixed solution 13of an ionic liquid soluble in water and water; and nozzles 11, 12 for supplying vapor obtained by vaporizing the mixed solution to the vicinity of the surface of the sample to be processed by the ionbeam.

Description

technical field [0001] The present invention relates to an ion milling device that uses an ion beam to create a plane or section of a sample. Background technique [0002] The ion milling device is used as a sample preprocessing device such as a scanning electron microscope (SEM: Scanning Electron Microscope), and is used to prepare a plane or a cross section of a sample in a wide range of fields to be observed. The ion milling device is a device that irradiates a sample with an ion beam to process the surface of the sample by physical sputtering, and irradiates without focusing and scanning the ion beam to polish the surface of the sample. There are a plane milling method and a section milling method. In the plane milling method, a sample is ground by irradiating an ion beam directly on the surface of the sample, and a wide range of samples can be cut at high speed. In the cross-section milling method, a shield is placed between the ion source and the sample, and the sampl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/30H01J37/20G01N1/28G01N1/32
CPCG01N1/32G01N1/28H01J2237/006H01J37/317H01J2237/31745H01J2237/3114H01J37/3056H01J37/20H01J2237/026H01J2237/002H01J37/08H01J37/09H01J37/1478H01J37/3053H01J2237/1502H01J2237/20214
Inventor 金子朝子高须久幸
Owner HITACHI HIGH-TECH CORP