Novel suspension polishing device

A kind of equipment and a new technology, applied in the field of new suspension polishing equipment, can solve the problems that affect the polishing pass rate, unstable product polishing quality, easy to collide with each other, etc., so as to ensure the stability and quality of polishing, improve the efficiency and quality of polishing, and prevent The effect of collision damage

Pending Publication Date: 2021-03-16
苏州新至远机器人有限公司
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

During this polishing process, the products are easy to collide with each other, resulting in damage to the product, affecting the polishing quality, and the polishing efficiency will be relatively low, and the product needs to be polished. The place is not stable enough; at the same time, some products will sink At the bottom of the silo, the position of these products is sometimes fixed relative to the silo, resulting in unstable polishing quality of the same batch of products and affecting the pass rate of polishing

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Novel suspension polishing device
  • Novel suspension polishing device
  • Novel suspension polishing device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] Embodiment one: see Figure 1-5 As shown, a novel suspension polishing equipment includes a frame 1, a polishing bin 2 arranged on the frame, and a polishing mechanism, and the polishing mechanism is moved and arranged above the polishing bin through a drive mechanism 3. The polishing mechanism is installed on a bracket 4, and the two ends of the bracket are connected with the driving mechanism, and the driving mechanism drives the bracket to move up and down;

[0035] The polishing mechanism comprises a main shaft drive motor 5, a driving main shaft 6, multiple sets of secondary transmission main shafts 7, multiple sets of tertiary connecting main shafts 8 and multiple sets of product positioning jigs 9, the top of each group of said product positioning jigs is connected to a Group the bottom detachable connection of the tertiary connection spindle;

[0036] The top of the drive spindle is connected to the support for rotation, the spindle drive motor is installed on ...

Embodiment 2

[0051] Embodiment two: see Figure 6 As shown, a new type of suspension polishing equipment, in this embodiment, its structure is basically similar to Embodiment 1, the difference is that: the bottom of the polishing bin is installed on a support plate 30, the bottom of the support plate Rotately connected with the frame through a rotating shaft 32, a rotating motor 33 is provided on the frame below the supporting plate, a bottom gear 34 is provided at the bottom of the rotating shaft, and a side portion is provided on the output shaft of the rotating motor. Gear 35, said side gear having a smaller diameter than said bottom gear, said side gear meshing with said bottom gear. The rotation direction of the rotating shaft is opposite to the rotation direction of the driving spindle, so that the relative speed between the product positioning fixture and the polishing bin is faster, that is, the relative speed between the product and the abrasive is faster, and the polishing effici...

Embodiment 3

[0052] Embodiment three: see Figure 7 As shown, a new type of suspension polishing equipment, in this embodiment, its structure is basically similar to that of Embodiment 1, the difference is that: the secondary gear is connected with the main gear through a connection mechanism, and the connection mechanism includes a connection Gear 36, the two sides of the connecting gear mesh with the secondary gear and the main gear respectively.

[0053] In this embodiment, in order to increase the distance between the two-stage transmission spindle and the drive spindle, that is, the distance between the three-stage connection spindle on the adjacent two-stage transmission spindle, in order to reduce the rotation between adjacent product positioning fixtures When grinding, the abrasive on the side is stirred to other positions to affect the polishing quality. Using the connecting gear to mesh the secondary gear with the main gear can not only increase the distance between the two, but ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a novel suspension polishing device. The novel suspension polishing device comprises a rack, a polishing stock bin and a polishing mechanism, wherein the polishing stock bin and the polishing mechanism are arranged on the rack. The novel suspension polishing device is characterized in that the polishing mechanism comprises a main shaft driving motor, a driving main shaft, aplurality of sets of second-level transmission main shafts, a plurality of sets of third-level connection main shafts and a plurality of sets of product positioning jigs, wherein the top of each setof product positioning jig is detachably connected with the bottom of the corresponding set of third-level connection main shaft; the driving main shaft drives the second-level transmission main shafts to rotate and rotate around the driving main shaft; and the second-level transmission main shafts drive the third-level connection main shafts to rotate and rotate around the second-level transmission main shafts. By means of the novel suspension polishing device, the polishing efficiency and quality are improved, and energy consumption and cost are reduced.

Description

technical field [0001] The invention relates to a polishing device, in particular to a novel suspension polishing device. Background technique [0002] In the prior art, when polishing some product parts, generally, the abrasive and the product are placed in the hopper, and then the motor is used to drive the hopper to rotate, so that the abrasive and the product placed in the abrasive Polishing is performed by rubbing against each other. During this polishing process, the products are easy to collide with each other, resulting in damage to the product, affecting the polishing quality, and the polishing efficiency will be relatively low, and the product needs to be polished. The place is not stable enough; at the same time, some products will sink At the bottom of the silo, these products are sometimes fixed in position relative to the silo, resulting in unstable polishing quality of the same batch of products and affecting the pass rate of polishing. Therefore, how to sol...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B24B31/00B24B31/12
CPCB24B31/003B24B31/12
Inventor 刘尚俊
Owner 苏州新至远机器人有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap