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Measuring method of graphic key dimension

A technology of key dimensions and graphics, applied in the field of measurement of key dimensions of graphics, can solve problems such as inability to measure, differences in key dimensions, error reporting, etc., and achieve the effect of improving measurement stability and avoiding measurement failures

Active Publication Date: 2022-06-07
HUA HONG SEMICON WUXI LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, due to different focal lengths, not only the key dimensions of the graphics are different, but also the contrast of the edges is different, and the OVL machine will not be able to measure when the graphics of different exposure units (shots) differ greatly, resulting in often error

Method used

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  • Measuring method of graphic key dimension
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Embodiment Construction

[0022] The technical solutions in the present application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are a part of the embodiments of the present application, but not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the protection scope of the present application.

[0023] In the description of this application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the accompanying drawings, which is only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the indicated device or element must have a ...

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Abstract

The application discloses a method for measuring critical dimensions of graphics, which relates to the field of semiconductor manufacturing. The method for measuring the key dimension of the graphics includes using an exposure machine to expose each exposure unit on the wafer, and the specific graphics formed on each exposure unit after the wafer is exposed are different; The critical dimensions of the specific graphics formed on each exposure unit; when using the overlay measuring machine to measure the critical dimensions of the specific graphics formed on each exposure unit, different reference graphics are established for each exposure unit; solve the problem of the current exposure unit When there is a large difference in the specific graphics above, the overlay measuring machine adopts a reference graphic to measure all exposure units, which is prone to error reporting; to avoid the measurement failure of the overlay measuring machine and improve the measurement stability of key dimensions Effect.

Description

technical field [0001] The present application relates to the field of semiconductor manufacturing, and in particular, to a method for measuring the critical dimension of a pattern. Background technique [0002] Integrated circuit manufacturing mainly includes photolithography, etching, deposition, thin film, CMP, etc. Among them, photolithography is the key process of pattern formation. In the photolithography process, the main steps of pattern formation are gluing, exposure, and development, and each step is very important. The machines used in the lithography process are mainly glue developing machines (ie Track) and exposure machines (ie Exposure Tool). [0003] The stability of the focal length is an important parameter of the exposure machine, and it is also a parameter that requires daily monitoring. At present, one method to monitor the stability of the focal length is to use the principle that the critical dimension (CD) of the graph close to the resolution limit...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G01B11/00
CPCG03F7/70625G01B11/00
Inventor 栾会倩吴长明姚振海金乐群姜冒泉
Owner HUA HONG SEMICON WUXI LTD