Multi-voltage control method and high-frequency power supply device of multi-voltage control mode

Abstract

The multiple voltage control method of the present invention comprises the steps of: (a) starting to supply a high-frequency power source to a plasma load; (b) performing a power source shock operation that continues the output of the high-frequency power source and increases the output; (c) detecting a reflected wave reflected from the plasma load to a high-frequency power supply side, and determining whether a corresponding reflected wave loss amount corresponding to the amount of the reflected wave is greater than a first set value; (d) when the step (c) is satisfied, limiting the VDD magnitude of the DC voltage of the RF power amplifier supplied to the high-frequency power supply to a first limit; (e) after the step (d), judging whether the corresponding reflected wave loss amount is smaller than a second set value, and the second set value is smaller than the first set value; and (f) if the step (e) is satisfied, executing the power supply impact action of the step (b) again.

Description

technical field [0001] The present invention relates to a multiple method for eliminating the mismatching aspect which minimizes the mismatching aspect after the ignition step or the start of the matching action and solves the problem that the process is stopped due to reflected waves or the main components are damaged. A voltage control method and a high-frequency power supply device of a multiple voltage control method. Background technique [0002] Plasma discharges are used to excite gases to generate reactive gases containing ions, radicals, atoms and molecules. Active gases are widely used in various fields, and are generally used in large-screen display manufacturing processes or semiconductor manufacturing processes, etc., for example, in processes such as etching (Etching), CVD (Chemical Vapor Deposition, chemical vapor deposition), ashing (Ashing) used in other processes. [0003] figure 1 is a block diagram of an example conventional plasma power supply system....

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Problems solved by technology

[0009] In order to prevent this problem, it is necessary to adjust the amount of transmitted power. However, the control method based on the deviation between the power command value and the feedback value is a structure that adjusts the power after the reflected wave occurs, so there is a possibility that important components will be damaged due to the reflected wave before adjusting the transmitted power. The problem

[0010] Further, in the above-mentioned existing documents, in order to prevent important components such as FETs from being damaged, the ignition operation needs to be stopped, but this has a problem of causing economic loss such as process interruption

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