Sealing door device and photoetching equipment

A technology for sealing doors and sealing plates, which is used in transportation and packaging, conveyor objects, electrical components, etc., can solve the problems affecting the efficiency of laser annealing, the productivity of lithography equipment, and the smooth movement, and achieves an improvement in the production of lithography equipment. The effect of improving the productivity of equipment, improving the efficiency of laser annealing

Pending Publication Date: 2021-05-04
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to propose a sealed door device to overcome the technical problems that the traditional sealed door device does not move smoothly and affects the efficiency of laser annealing and the productivity of lithography equipment

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sealing door device and photoetching equipment
  • Sealing door device and photoetching equipment
  • Sealing door device and photoetching equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] The technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and through specific implementation methods.

[0035] In describing the present invention, it is to be understood that the terms "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", The orientation or positional relationship indicated by "bottom", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying the referred device Or elements must have a certain orientation, be constructed and operate in a certain orientation, and thus should not be construed as limiting the invention.

[0036] The invention provides a sealed door device, which is applied to the laser annealing process. The sealed door device is arranged on the silicon wafer tra...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a sealing door device and photoetching equipment. The sealing door device comprises a sealing plate and a sealing door, wherein the sealing plate is provided with a material transmission port, and the sealing door has a closed state for shielding the material transmission port and an open state for leaving the material transmission port. The sealing door device further comprises an air cylinder sliding table, a guide rail and a parallelism error eliminating assembly, wherein the air cylinder sliding table and the guide rail are arranged on the two sides of the material conveying port, one end of the sealing door is connected with the air cylinder sliding table, the other end of the sealing door is connected with a sliding block of the guide rail, and the parallelism error eliminating assembly is arranged between the sealing door and the air cylinder sliding table and / or between the sealing door and the sliding block. According to the sealing door device, laser annealing efficiency can be effectively improved, and the yield of the photoetching equipment can be improved. Correspondingly, the invention also provides the photoetching equipment.

Description

technical field [0001] The invention relates to the technical field of integrated circuit manufacturing, in particular to a hermetic door device and photolithography equipment. Background technique [0002] The laser annealing process can anneal on the back without damaging the front device, and has high activation efficiency. It gradually replaces the traditional annealing process in the manufacturing fields of insulated gate bipolar transistors, thin film transistors and image sensors. During laser annealing, the laser light will be irradiated through the chip library equipment for silicon wafer transmission, which will affect the safety of operators. Therefore, it is necessary to add a sealed door device in the silicon wafer transmission channel. Generally, the airtight door device includes an airtight door, a cylinder slide and a guide rail, and the air cylinder slide and the guide rail are respectively arranged on both sides of the airtight door, and the cylinder slide ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/268H01L21/67H01L21/677
CPCH01L21/268H01L21/67115H01L21/67739H01L21/67742
Inventor 刘凯王刚
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap