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Wafer frame and vertical wafer boat with same

A wafer, mutually perpendicular technology, applied in the direction of gaseous chemical plating, coating, electrical components, etc., can solve the problems of corrosion, increase the cost of the film formation process, etc., to achieve the effect of prolonging the service life

Inactive Publication Date: 2021-05-11
XIA TAI XIN SEMICON QING DAO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Particles or chemicals in the diffuser may corrode the tank
In addition, changing the wafer boat will increase the cost of the thin film formation process

Method used

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  • Wafer frame and vertical wafer boat with same
  • Wafer frame and vertical wafer boat with same
  • Wafer frame and vertical wafer boat with same

Examples

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Embodiment Construction

[0050] The technical solutions of the present invention will be clearly and completely described below in conjunction with specific embodiments and accompanying drawings. Apparently, the described embodiments are only some, not all, embodiments of the present invention. Based on the implementation manners in the present invention, all other implementation manners obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of the present invention. Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field of the invention. The terms used herein in the description of the present invention are for the purpose of describing specific embodiments only, and are not intended to limit the present invention.

[0051] In describing the embodiments of the present invention, it should be understood that the terms "center", "long...

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PUM

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Abstract

The invention provides a vertical wafer boat for a diffusion process. The vertical boat includes a plurality of wafer racks. Each wafer holder includes a vertical support member and a plurality of wafer support arms. The plurality of wafer support arms extend from sidewalls of the vertical support member. Each wafer support arm comprises a support body and a protruding part. The support body is between the vertical support member and the protrusion. The support body is horizontally aligned with the center of the protruding part. The vertical length of the protruding part is smaller than the vertical length of the support body.

Description

technical field [0001] The invention relates to a semiconductor wafer carrier, in particular to a vertical crystal boat. Background technique [0002] To perform the thin film formation process, wafers are loaded into vertical boats. Next, the vertical boat is placed vertically into a diffusion device, such as a low pressure chemical vapor deposition (LPCVD) device, to perform chemical reactions. Vertical wafer boats have slots for carrying wafers. Particles or chemicals in the diffuser may cause corrosion to the tank. In addition, replacing the wafer boat will increase the cost of the thin film formation process. Contents of the invention [0003] In view of this, it is necessary to provide a durable wafer holder. [0004] In addition, it is also necessary to provide a vertical crystal boat with the wafer frame. [0005] The present invention provides a wafer rack for carrying a plurality of wafers, comprising: a vertical support member; and a plurality of wafer supp...

Claims

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Application Information

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IPC IPC(8): H01L21/673
CPCH01L21/67303H01L21/673H01L21/67309C23C16/4583C23C16/4587H01L21/6732
Inventor 李殷廷金成基郭世根
Owner XIA TAI XIN SEMICON QING DAO LTD