Tail gas filtering device and coating equipment
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- JIANGSU FAVORED NANOTECHNOLOGY CO LTD
- Publication Date
- 2021-05-28
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Abstract
Description
technical field
[0001] The invention relates to the field of tail gas treatment, in particular to a tail gas filtering device and coating equipment. Background technique
[0002] During the coating process, the reaction raw materials are fed into the reaction chamber for reaction, and part of the unreacted raw materials and part of the by-products generated by the reaction will form tail gas and need to be discharged from the reaction chamber in time to make the pressure of the reaction chamber Within the control range, these exhaust gases are usually harmful to the environment if they are directly discharged.
[0003] The exhaust gas is usually absorbed by setting a filter bottle at the outlet position. Filter material is placed in the filter bottle, and when the tail gas treatment capacity of the filter bottle reaches the upper limit, it is replaced with a new filter bottle. For a coating equipment, the reaction chamber of the coating equipment needs to be maintained at ...