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Mask repair control method and device and computer readable storage medium

A control method and storage medium technology, applied in the field of reticle repair, can solve problems such as poor graphic effect, unobtainable, unguaranteed resection accuracy, etc., to achieve the effect of improving effect and precision, reducing cost, and improving yield

Pending Publication Date: 2021-05-28
SHENZHEN NEWWAY PHOTOMASK MAKING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In the actual repair process, if the defect is relatively small (such as a few microns or ten or twenty microns), it can be completely presented in a field of view of the laser repair machine, which is relatively easy to handle; if the defect size is relatively large (such as seventy or eighty microns or even Larger), and the covered graphics are relatively small, the entire defect cannot be fully presented in one field of view, or the graphics are irregular graphics such as arcs, and the existing laser repair machine cannot provide reference during the cutting operation. However, the surrounding graphics cannot be displayed on the same monitor, so effective reference cannot be obtained. In this case, the graphics effect after cutting will be relatively poor, and the cutting accuracy cannot be guaranteed.

Method used

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  • Mask repair control method and device and computer readable storage medium
  • Mask repair control method and device and computer readable storage medium
  • Mask repair control method and device and computer readable storage medium

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Embodiment Construction

[0023] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the following exemplary embodiments and descriptions are only used to explain the present invention, not as a limitation to the present invention, and, in the case of no conflict, the embodiments in the present invention and the features in the embodiments can be combined with each other .

[0024] like figure 1 As shown, an optional embodiment of the present invention provides a reticle repair control method, including the following steps:

[0025] Step S1, reading the actual image of the mask plate to be repaired, extracting the graphic of the area to be repaired from the actual image and saving it as the first graphic;

[0026] Step S2, reading a reference image, selecting an area from the reference image that has the same figure as the original figure corresponding to the area to be repaired as a refer...

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PUM

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Abstract

The embodiment of the invention relates to a mask repair control method and device and a computer readable storage medium, and the method comprises the following steps: reading an actual image of a to-be-repaired mask, extracting a pattern of a to-be-repaired area from the actual image, and storing the pattern as a first pattern; reading a reference image, selecting an area with the same graph as the original graph corresponding to the to-be-restored area from the reference image as a reference area, extracting the graph of the reference area and storing the graph as a second graph; adjusting the transparency of the second graph until the content of the next layer of window can be clearly seen, and storing the second graph after the transparency is adjusted as a third graph; laminating the third pattern on the first pattern, and enabling the third pattern to be overlapped with the first pattern; and controlling a laser repairing machine to repair the mask to be repaired according to the boundary of the third pattern. According to the embodiment of the invention, the repairing effect and precision can be effectively improved.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of reticle restoration, and in particular, to a reticle restoration control method, device, and computer-readable storage medium. Background technique [0002] Regardless of whether it is in the mask manufacturing industry or LCD, TP, FPC, PCB, IC and other manufacturing industries, the micron-scale circuits designed generally need to go through yellow light processes such as exposure, development, etching, and stripping. Since the processes in these industries are mostly wet processes, and at the same time, coupled with the influence of manufacturing environment, raw materials and other factors, more or less will lead to defects in the manufactured products. Among them, protrusions or residues in graphics are the most common These protrusions and residues are unacceptable, and need to be repaired with a laser repair machine, that is, the high energy of the laser is used for cutting (cu...

Claims

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Application Information

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IPC IPC(8): G06T5/00G06T5/50G06T7/11
CPCG06T5/50G06T7/11G06T2207/30108G06T5/00
Inventor 杜武兵林伟司继伟
Owner SHENZHEN NEWWAY PHOTOMASK MAKING