Gas-liquid shared pipeline cleaning device

Abstract

The invention discloses a gas-liquid shared pipeline cleaning device. The device comprises a rubber pump and a cleaning device, wherein the rubber pump is connected to a mounting device with a dismounting function, and the rubber pump is connected to the cleaning device with a drying function and a rapid cleaning function. According to the gas-liquid shared pipeline cleaning device, a pipeline structure in the mounting device adopts a section-by-section connection mode, is simple to disassemble and convenient to recycle, a first pipeline is more convenient and tight to mount by introducing a first flange and a second flange, a glue solution tank, a cleaning solution tank and a nitrogen tank are respectively connected for use by the cleaning device through a multi-way device, so that the functions of using, cleaning and drying are separated, cleaning is quicker and more convenient, a one-way valve in the multi-way device is used, the condition that gas and liquid flow back, so that use is affected is avoided, an inner connector and an outer connector match, connection section by section for use is achieved and more convenient, and a pipe layer plays a role in flow guiding.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment, in particular to a device for cleaning pipelines shared by gas and liquid. Background technique [0002] The glue homogenizer is a device that drips various glue solutions on a high-speed rotating substrate, and uses centrifugal force to coat the glue dripped on the substrate evenly on the substrate. The thickness of the film depends on the speed of the glue homogenizer and the sol. viscosity. [0003] In the prior art, due to the fast volatility of the photoresist, when the pipeline of the homogenizer is not used for a period of time, the glue pipeline will be cleaned, but a small amount of cleaning fluid will hang on the pipeline wall The problem is that the amount of photoresist in the pipeline will decrease when the equipment is used next time, which will affect the uniformity of the glue on the surface of the silicon wafer. The current solution is to use photoresist to wash ...

AI Technical Summary

Problems solved by technology

[0003] In the prior art, due to the fast volatility of photoresist, when the pipeline of the homogenizer is not used for a period of time, the glue pipeline will be cleaned, but a small amount of cleaning fluid will hang on the pipeline wall The problem is that the amount of photoresist in the pipeline will decrease when the equipment is used next time, which will affect the uniformity of the glue on the surface of the silicon wafer. The current solution is to use photoresist to wash away the excess cleaning solution. But this wastes a lot of photoresist

For some laboratories and research institutes, work efficiency is reduced and costs are increased

Images