Illumination light path, defect detection device and light intensity measurement method
A technology for lighting light path and defect detection, which is used in measurement devices, optical testing of defects/defects, and material analysis by optical means. It can solve problems such as low measurement efficiency, affecting equipment operation efficiency, and eye damage.
Pending Publication Date: 2021-06-22
SHANGHAI HUALI MICROELECTRONICS CORP
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Problems solved by technology
[0005] The purpose of the present invention is to provide an illumination optical path, a defect detection device, and a method for measuring light intensity, so as to solve the problem of manually measuring light intensity in the prior art, which requires dismantling the optical path cover, which is time-consuming and laborious, and the measurement efficiency is not high. It is easy to affect the operating efficiency of the equipment and cause damage to the eyes of the measuring personnel
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[0032] In order to make the object, advantages and characteristics of the present invention clearer, the following combination Figure 1 to Figure 6 The illumination light path, defect detection device and light intensity measurement method proposed by the present invention are further described in detail. It should be noted that the drawings are in a very simplified form and all use inaccurate proportions, which are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention, and are not used to limit the limiting conditions for the implementation of the present invention, so they do not have technical In the substantive meaning above, any modification of structure, change of proportional relationship or adjustment of size should still fall within the scope of the technical contents disclosed in the present invention without affecting the effects and goals that can be achieved by the present invention. within the scope cover...
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The invention provides an illumination light path, a defect detection device and a light intensity measurement method. The illumination light path comprises a light source and an oblique light path, the tail end of the oblique light path is provided with a light intensity measurement device used for measuring light intensity, and the light intensity measurement device comprises a probe and a probe support; the probe is mounted on the probe support; the probe support is positioned at the tail end of the oblique light path; the probe support is connected with a driving piece; the driving piece is used for controlling the steering of the probe support; when the defect detection device is in a working state, the probe deviates from the illumination light path under the action of the driving piece; when the light intensity of the tail end of the oblique light path needs to be measured, the light emitted by the light source can reach the probe through the oblique light path under the action of the driving piece. According to the light intensity measurement device provided by the invention, manual light intensity measurement is avoided, the purpose of automatically measuring the light intensity is achieved, the time of stopping equipment for measuring the light intensity is shortened, the operation efficiency of the equipment is improved, and the detected light intensity can be directly read outside the equipment.
Description
technical field [0001] The invention relates to the technical field of semiconductor equipment, in particular to an illumination optical path, a defect detection device and a light intensity measurement method. Background technique [0002] At present, the method of measuring the laser light intensity in the KT SP2 model machine is manual measurement. Often during the measurement, because the laser light intensity in the machine is generally between 200MW and 300MW, the eyes cannot be looked directly at, and the measurement personnel need to wear a good Protective glasses, then remove the optical path cover of the machine, and measure the laser light intensity at the end of the oblique optical path. [0003] However, the measurement method in the prior art requires manual measurement, which is time-consuming and labor-intensive, increases the workload, increases the re-set time of the machine, reduces the operating efficiency of the equipment, and because of the direct laser...
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IPC IPC(8): G01N21/01G01N21/95
CPCG01N21/01G01N21/95
Inventor 张雨茜敖海林
Owner SHANGHAI HUALI MICROELECTRONICS CORP