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Photomask cleaning device

A cleaning device and photomask technology, which is applied in the field of photomasks, can solve problems such as particle detection errors, low cleaning efficiency, and difficult wind control, and achieve the effect of avoiding the risk of blowout and high cleaning efficiency

Inactive Publication Date: 2021-06-29
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the wind power of this cleaning method is not easy to control, and there is a risk of blowing the protective layer film on the lower surface of the photomask, thereby affecting the production progress; and working in an open environment, the dust layer in the environment still adheres to the photomask during the operation On the other hand, there are errors in the detection of particles, and sometimes it is necessary to repeat the purging operation many times, and the cleaning efficiency is low

Method used

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Examples

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Embodiment Construction

[0026] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Apparently, the described embodiments are only some of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application.

[0027] The application will be further described below in conjunction with the accompanying drawings and specific embodiments:

[0028] An embodiment of the present application provides a mask cleaning device, please refer to figure 1 , the photomask cleaning apparatus 100 includes a housing 10 and a cleaning unit 20 . The housing 10 has a chamber 40 inside. The cleaning unit 20 is disposed in a chamber 40 inside the housing 10 .

[0029] For this example, see figure 1 or ...

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Abstract

The invention discloses a photomask cleaning device. The photomask cleaning device comprises a shell and a cleaning unit. The shell comprises a first supporting plate and a second supporting plate which are oppositely arranged, and the shell is provided with a cavity. The cleaning unit comprises a compressor and at least two ion wind bars located between the first supporting plate and the second supporting plate. The ion wind bars and the compressor are oppositely arranged at the two ends of the cavity, and therefore the wind direction in the photomask cleaning device is from the ion wind bars to the compressor; and the ion wind bars comprise a first ion wind bar and a second ion wind bar, wherein the first ion wind bar is arranged closely to the first supporting plate, and the second ion wind bar is arranged closely to the second supporting plate. According to the photomask cleaning device, a photomask can be purged efficiently, and a film protection layer on the surface of the photomask is not prone to being damaged.

Description

technical field [0001] The present application relates to the field of photomask technology, in particular to a photomask cleaning device. Background technique [0002] In the production process of TFT substrates, different masks need to be replaced according to different processes. Due to the influence of static electricity and the surrounding environment, some gray layers will adhere to the surface of the mask after long-term use. If these gray layers are not removed in time It will lead to defective products. If a dust layer is found on the surface of the photomask, it must be cleaned. The traditional cleaning method is that the operator uses an antistatic ion air gun to blow the surface of the photomask. until clean. However, the wind power of this cleaning method is not easy to control, and there is a risk of blowing the protective layer film on the lower surface of the photomask, thereby affecting the production progress; and working in an open environment, the dust ...

Claims

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Application Information

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IPC IPC(8): B08B5/02B08B5/04B08B7/00B08B13/00G01L19/00G01V9/00
CPCB08B5/02B08B5/04B08B7/00B08B13/00G01L19/00G01V9/00
Inventor 赖志鹏莫超德
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD