IMITO structure of OLED and OLED shadow elimination coating method
A technology of shadow elimination and shadow elimination layer, which is applied in the direction of sputtering plating, ion implantation plating, vacuum evaporation plating, etc., can solve the problems of affecting developing and visual effects, not satisfying OLED products, and obvious etching marks, etc., to achieve Improve development and visual effects, reduce production costs, and reduce roughness
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[0025] In the present invention, it should be understood that the terms "length"; "width"; "upper"; "lower"; "front"; "back"; "left"; "right"; "vertical"; "; "Top"; "Bottom" "Inner"; "Outer"; "Clockwise"; "Counterclockwise"; "Axial"; "Plane Direction"; The orientation or positional relationship shown in the accompanying drawings is only for the convenience of describing the present invention and simplifying the description, and does not indicate or imply that the referred device or element must have a specific orientation; it is constructed and operated in a specific orientation, so it cannot be understood as Limitations on the Invention.
[0026] In the present invention TiO 2 +SiO2 2 Abbreviated as IM, TiO 2 +SiO2 2 +ITO is referred to as IMITO for short.
[0027] Such as Figure 1 to Figure 5 As shown, an IMITO structure of an OLED is characterized in that: it includes a glass substrate 1, a shadow elimination layer 2 and a conductive layer 3, and the shadow eliminati...
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