IMITO structure of OLED and OLED shadow elimination coating method

A technology of shadow elimination and shadow elimination layer, which is applied in the direction of sputtering plating, ion implantation plating, vacuum evaporation plating, etc., can solve the problems of affecting developing and visual effects, not satisfying OLED products, and obvious etching marks, etc., to achieve Improve development and visual effects, reduce production costs, and reduce roughness

Pending Publication Date: 2021-07-02
WUHU TOKEN SCI
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing glass substrate with ITO has obvious etching marks after etching the circuit, which affects the development and visual effects, and cannot meet the needs of OLED products.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • IMITO structure of OLED and OLED shadow elimination coating method
  • IMITO structure of OLED and OLED shadow elimination coating method
  • IMITO structure of OLED and OLED shadow elimination coating method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] In the present invention, it should be understood that the terms "length"; "width"; "upper"; "lower"; "front"; "back"; "left"; "right"; "vertical"; "; "Top"; "Bottom" "Inner"; "Outer"; "Clockwise"; "Counterclockwise"; "Axial"; "Plane Direction"; The orientation or positional relationship shown in the accompanying drawings is only for the convenience of describing the present invention and simplifying the description, and does not indicate or imply that the referred device or element must have a specific orientation; it is constructed and operated in a specific orientation, so it cannot be understood as Limitations on the Invention.

[0026] In the present invention TiO 2 +SiO2 2 Abbreviated as IM, TiO 2 +SiO2 2 +ITO is referred to as IMITO for short.

[0027] Such as Figure 1 to Figure 5 As shown, an IMITO structure of an OLED is characterized in that: it includes a glass substrate 1, a shadow elimination layer 2 and a conductive layer 3, and the shadow eliminati...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an IMITO structure of an OLED, the IMITO structure comprises a glass substrate, a shadow elimination layer and a conductive layer, the shadow elimination layer is arranged between the conductive layer and the glass substrate, the shadow elimination layer is arranged on the glass substrate, and the conductive layer is arranged on the shadow elimination layer. The shadow elimination layer comprises a TiO2 film layer and a SiO2 film layer, the TiO2 film layer is arranged on the glass substrate, the SiO2 film layer is arranged on the TiO2 film layer, and the conductive layer is arranged on the SiO2 film layer. According to the invention, the purpose of shadow elimination is achieved by plating TiO2 and SiO2 materials under the ITO film layer, that is, the development and visual effects of the OELD are improved through the shadow elimination (IMITO) technology. The invention further discloses an OLED shadow elimination coating method which comprises the steps of raw material cleaning, TiO2 coating, SiO2 coating, ITO coating, film layer polishing, cleaning inspection and packaging shipment, and the glass substrate is sequentially subjected to the procedures of raw material cleaning, TiO2 coating, SiO2 coating, ITO coating, film layer polishing, cleaning inspection and packaging shipment on the conveying roller way.

Description

technical field [0001] The invention belongs to the field of display technology, and in particular relates to an OLED IMITO structure and an OLED shadow-eliminating coating method. Background technique [0002] With the diversified development of display technology, OLED, as the frontier of current display technology, has begun to have a huge impact on traditional LCD products with the characteristics of ultra-thin, low energy consumption, wide viewing angle, and high-quality image quality, especially for mid-to-high-end displays. market, will gradually replace LCD. OLED refers to an organic semiconductor that is composed of an extremely thin organic material coating and a glass substrate and emits light when current passes through it, and has self-luminous characteristics. And our company has 20 years of experience in coating technology, and in 2016, we have started to develop and mass-produce the important components needed for OELD products - glass substrates with conduc...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): H01L51/52H01L51/56C23C14/08C23C14/10C23C14/35
CPCC23C14/352C23C14/083C23C14/10C23C14/086H10K50/84H10K71/00
Inventor 秦家春郑建军何晏兵许沭华吕如军朱常青
Owner WUHU TOKEN SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products