High-resolution micro-display structure and preparation method thereof

Abstract

The invention discloses a high-resolution micro-display structure and a preparation method thereof, belonging to the technical field of micro-display. The high-resolution micro-display structure comprises a driving circuit layer, a pixel definition layer, a blue light emitting layer, a cathode film layer, a packaging layer, a light filtering layer and a transparent protection layer which are sequentially arranged from inside to outside, wherein the light filtering layer comprises a red light quantum layer and a green light quantum layer; the transparent protection layer is arranged at the position, opposite to the blue light emitting layer, of the packaging layer; and the surfaces of a red light quantum layer and a green light quantum layer are covered with the transparent protection layer. According to the method, the quantum dots are used for replacing a color photoresist, photoetching and dry etching processes are used for patterning the quantum dots, high-color-gamut, high-brightness and high-precision micro-display colorization can be realized, and the requirement of a high-resolution micro-display can be met.

Description

technical field [0001] The invention relates to the field of microdisplay technology, in particular to a high-resolution microdisplay structure and a preparation method thereof. Background technique [0002] In high-resolution microdisplays, as the size of the pixel decreases, the size of the filter CF is required, and the size of the Color Filter is getting smaller and smaller. For example, 5000PPI requires the line width of CF to be ≤2um. The CF material is generally a negative photoresist, and it is difficult to achieve a resolution of ≤2um, especially the low-temperature CF commonly used in microdisplays, which has poorer resolution and cannot meet the high-resolution linewidth requirements. In addition, as the CF line width becomes smaller, the stability of the color photoresist will deteriorate, and it will be easily degraded during use, resulting in a poor color gamut. Therefore, it is necessary to develop a colorization technology that can meet the high-resolution r...

AI Technical Summary

Problems solved by technology

CF materials are generally negative glue, and the resolution is difficult to achieve ≤2um, especially the low-temperature CF commonly used in micro-displays, which has worse resolution and cannot meet the high-resolution linewidth requirements

In addition, as the CF line width becomes smaller, the stability of the color photoresist will deteriorate, and it will be easily degraded during use, resulting in poor color gamut

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