Variable-focal-length semiconductor surface micro lens, manufacturing method thereof and laser

Abstract

The embodiment of the invention discloses a variable-focal-length semiconductor surface micro lens, a manufacturing method thereof and a laser. The variable focal length semiconductor surface microlens includes a substrate and a lens unit, wherein the lens unit is located on one side of the substrate; the lens unit comprises a micro lens and a varifocal layer, the varifocal layer is located on the side, away from the substrate, of the micro lens and covers the light-emitting surface of the micro lens, and the varifocal layer is used for adjusting the refractive index of the lens unit; the refractive index of the lens unit is difference between the refractive index of the micro lens and the refractive index of the varifocal layer. According to the micro lens, the variable focal length of the surface micro lens is realized, namely, different focal lengths of the micro lens are realized, the method is simple and practical, dependence on a high-precision surface micro lens etching process when a long-focal-length micro lens is realized is avoided, cost is low, and meanwhile, the overall product yield is ensured.

Description

technical field [0001] Embodiments of the present invention relate to semiconductor surface microlens technology, in particular to a semiconductor surface microlens with variable focal length, a manufacturing method thereof, and a laser. Background technique [0002] In the field of semiconductor surface microlens technology, in order to produce a long focal length microlens structure, it usually needs to rely on a surface microlens process with a large curvature, that is, a high-precision surface microlens etching process is required, and the cost is high. Moreover, even if a microlens structure with a long focal length is made by using a high-precision surface microlens etching process, if microlenses with different etching depths are made on the surface of the semiconductor at the same time to make microlenses with different long focal lengths, it will also affect the semiconductor. The optical uniformity of the surface microlens is affected, resulting in poor overall pro...

AI Technical Summary

Problems solved by technology

[0002] In the field of semiconductor surface microlens technology, in order to produce a long focal length microlens structure, it is usually necessary to rely on a surface microlens process with a large curvature, that is, it is necessary to use high-precision Surface microlens etching process, high cost

Moreover, even if a high-precision surface microlens etching process is used to manufacture a microlens structure with a long focal length, if microlenses with different etching depths are made on the surface of the semiconductor at the same time to make microlenses with different long focal lengths, it will also affect the semiconductor. The optical uniformity of the surface microlens is affected, resulting in poor overall product yield

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